公开(公告)号：US11009801B2

公开(公告)日：2021-05-18

申请号：US17035105

申请日：2020-09-28

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. Johnston ,  David Michael Corriveau ,  Cheuk Ming Lee ,  Jae Myung Yoo ,  WeiMin Tao ,  Antoine P. Manens

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

公开(公告)号：US10788762B2

公开(公告)日：2020-09-29

申请号：US16284516

申请日：2019-02-25

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. Johnston ,  David Michael Corriveau ,  Cheuk Ming Lee ,  Jae Myung Yoo ,  WeiMin Tao ,  Antoine P. Manens

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.