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公开(公告)号：US10379450B2
公开(公告)日：2019-08-13
申请号：US15867369
申请日：2018-01-10
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Thomas L. Laidig , Jang Fung Chen , John White
Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.
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公开(公告)号：US10901328B2
公开(公告)日：2021-01-26
申请号：US16146054
申请日：2018-09-28
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Preston Fung , Sean Screws , Cheuk Ming Lee , Jae Myung Yoo
IPC: G03F7/20
Abstract: The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.
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公开(公告)号：US10031427B2
公开(公告)日：2018-07-24
申请号：US14871066
申请日：2015-09-30
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Jeffrey Kaskey , Thomas Laidig
Abstract: Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.
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公开(公告)号：US20150173166A1
公开(公告)日：2015-06-18
申请号：US14371412
申请日：2013-01-11
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston
IPC: H05H1/46
CPC classification number: H05H1/46 , C23C16/511 , H01J37/32192 , H01J37/3222
Abstract: A segmented antenna assembly for use in a plasma enhanced chemical vapor deposition (PECVD) apparatus. One embodiment provides an apparatus comprising a chamber body having a top surface and a bottom surface, an antenna comprising a first segment, a second segment electrically coupled to the first segment and extending through an interior volume of the chamber, and a third segment electrically coupled to the second segment, and a dielectric layer disposed around an outer diameter of the second segment.
Abstract translation: 一种用于等离子体增强化学气相沉积（PECVD）装置的分段天线组件。 一个实施例提供了一种装置，其包括具有顶表面和底表面的室主体，天线包括第一段，电耦合到第一段并延伸穿过室的内部空间的第二段，以及第三段电耦合 并且设置在第二段的外径周围的电介质层。
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公开(公告)号：US20150002019A1
公开(公告)日：2015-01-01
申请号：US14371415
申请日：2013-01-11
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Shinichi Kurita
IPC: C23C16/511 , H01J37/32
CPC classification number: C23C16/511 , C23C16/4409 , H01J37/3222 , H01J37/32513
Abstract: A bellows which forms a flexible coupling between the lid of a processing chamber and an antenna feed through. One embodiment provides an apparatus comprising a chamber body having a chamber lid, a feed through extending through the chamber lid, an antenna coupled to and extending through the feed through to an internal volume of the chamber body, and a bellows comprising a first flange, the first flange coupled to the feed through, a second flange, the second flange coupled to the chamber lid, and a center portion extending between the first flange and the second flange.
Abstract translation: 波纹管，其形成处理室的盖和天线馈通之间的柔性耦合。 一个实施例提供了一种装置，其包括具有室盖的室主体，延伸穿过室盖的进料，耦合到并通过进料通过室主体内部空间的天线，以及包括第一凸缘的波纹管， 联接到进料通道的第一凸缘，第二凸缘，联接到室盖的第二凸缘以及在第一凸缘和第二凸缘之间延伸的中心部分。
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Patent Agency Ranking
公开(公告)号：US12061422B2
公开(公告)日：2024-08-13
申请号：US17157634
申请日：2021-01-25
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Preston Fung , Sean Screws , Cheuk Ming Lee , Jae Myung Yoo
IPC: G03F7/00
CPC classification number: G03F7/7075 , G03F7/707 , G03F7/70716 , G03F7/70758 , G03F7/70775 , G03F7/70791
Abstract: The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.
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公开(公告)号：US09315900B2
公开(公告)日：2016-04-19
申请号：US14371415
申请日：2013-01-11
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Shinichi Kurita
IPC: C23C16/00 , C23C16/511 , C23C16/44 , H01J37/32
CPC classification number: C23C16/511 , C23C16/4409 , H01J37/3222 , H01J37/32513
Abstract: A bellows which forms a flexible coupling between the lid of a processing chamber and an antenna feed through. One embodiment provides an apparatus comprising a chamber body having a chamber lid, a feed through extending through the chamber lid, an antenna coupled to and extending through the feed through to an internal volume of the chamber body, and a bellows comprising a first flange, the first flange coupled to the feed through, a second flange, the second flange coupled to the chamber lid, and a center portion extending between the first flange and the second flange.
Abstract translation: 波纹管，其形成处理室的盖和天线馈通之间的柔性耦合。 一个实施例提供了一种装置，其包括具有室盖的室主体，延伸穿过室盖的进料，耦合到并通过进料通过室主体内部空间的天线，以及包括第一凸缘的波纹管， 联接到进料通道的第一凸缘，第二凸缘，联接到室盖的第二凸缘以及在第一凸缘和第二凸缘之间延伸的中心部分。
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公开(公告)号：US11009801B2
公开(公告)日：2021-05-18
申请号：US17035105
申请日：2020-09-28
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , David Michael Corriveau , Cheuk Ming Lee , Jae Myung Yoo , WeiMin Tao , Antoine P. Manens
IPC: G03F7/20
Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.
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公开(公告)号：US10788762B2
公开(公告)日：2020-09-29
申请号：US16284516
申请日：2019-02-25
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , David Michael Corriveau , Cheuk Ming Lee , Jae Myung Yoo , WeiMin Tao , Antoine P. Manens
IPC: G03F7/20
Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.
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公开(公告)号：US10036966B2
公开(公告)日：2018-07-31
申请号：US15364748
申请日：2016-11-30
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , John White , Thomas Laidig
CPC classification number: G03F7/70808 , G03F7/70775 , G03F7/708 , G03F7/70858 , G03F7/70866 , G03F7/70933 , G03F9/00 , G03F9/70 , G03F9/7049 , G03F9/7057 , G03F2009/005
Abstract: Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, laminar gas flow is provided inside a photolithography system during operation. With laminar gas flow instead of turbulent gas flow inside the system, accuracy of the measurement of the location of a substrate disposed inside the system is improved due to the improved signal integrity of interferometers.
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