公开(公告)号：US10451564B2

公开(公告)日：2019-10-22

申请号：US15962981

申请日：2018-04-25

Applicant: Applied Materials, Inc.

Inventor： Qin Zhong ,  Antoine P. Manens ,  Hwan J. Jeong

IPC: G01N21/958 ,  G02B26/08 ,  G01M11/02 ,  G03F7/20 ,  G03F9/00

Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.

公开(公告)号：US11009801B2

公开(公告)日：2021-05-18

申请号：US17035105

申请日：2020-09-28

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. Johnston ,  David Michael Corriveau ,  Cheuk Ming Lee ,  Jae Myung Yoo ,  WeiMin Tao ,  Antoine P. Manens

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

公开(公告)号：US10788762B2

公开(公告)日：2020-09-29

申请号：US16284516

申请日：2019-02-25

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. Johnston ,  David Michael Corriveau ,  Cheuk Ming Lee ,  Jae Myung Yoo ,  WeiMin Tao ,  Antoine P. Manens

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.