公开(公告)号：US20210292894A1

公开(公告)日：2021-09-23

申请号：US16326651

申请日：2017-08-18

Applicant: Applied Materials, Inc.

Inventor： Fei PENG ,  Beom Soo PARK ,  Soo Young CHOI ,  Sanjay D. YADAV ,  Young-Jin CHOI ,  Himanshu JOSHI

IPC: C23C16/44 ,  C23C16/52 ,  H01J37/32 ,  G01K1/02

Abstract: Embodiments described herein generally relate to a substrate processing chamber, and more specifically to an apparatus and method for monitoring a cleaning processing for the substrate processing chamber. A processor receives one or more temperature readings from one or more sensors disposed in a substrate processing chamber. The processor determines a peak for each temperature reading from the one or more temperature readings, which indicate an end of exothermic film clean reaction. Upon determining that each temperature reading has peaked, the process issues a notification to cease the cleaning process.

公开(公告)号：US20200020512A1

公开(公告)日：2020-01-16

申请号：US16035431

申请日：2018-07-13

Applicant: Applied Materials, Inc.

Inventor： Weiting CHEN ,  Lynn YANG ,  Christy PAN ,  Beom Soo PARK ,  Young-Jin CHOI ,  Max CHANG

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/50 ,  B08B7/00

Abstract: A method and apparatus for obtaining at least one normalized baseline spectrum for a processing volume of a processing chamber; calculating a distribution value of the normalized baseline spectrum; obtaining a plurality of normalized cleaning process spectrums; calculating a distribution function of the plurality of normalized cleaning process spectrums; comparing the distribution value to the distribution function; and determining an end point by identifying when the distribution function approaches the distribution value. A method includes: initiating a cleaning process in a processing chamber, flowing a cleaning gas into a processing volume of the processing chamber; obtaining a normalized baseline spectrum; measuring a plurality of intensity spectrums; calculate a plurality of normalized cleaning process spectrums; comparing a distribution value of the normalized baseline spectrum to a distribution function of the plurality of normalized cleaning process spectrums; and determining an end point by identifying when the distribution function approaches the distribution value.