Tilted magnetron in a PVD sputtering deposition chamber

    公开(公告)号:US11784032B2

    公开(公告)日:2023-10-10

    申请号:US17285074

    申请日:2018-11-14

    CPC classification number: H01J37/3455 C23C14/35 H01J37/3408 H01J2237/332

    Abstract: A chamber includes a target (16) and a magnetron (50) disposed over the target (16). The magnetron (50) includes a plurality of magnets (52, 54). The magnetron (50) has a longitudinal dimension and a lateral dimension. The longitudinal dimension of the magnetron (50) is tilted with respect to the target (16) so the distances between magnets (52, 54) and the target (16) vary. As the magnetron (50) rotates during operation, the strength of the magnetic field produced by the magnetron (50) is an average of the various strengths of magnetic fields produced by the magnets (52, 54). The averaging of the strengths of the magnetic fields leads to uniform film properties and uniform target erosion.

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