公开(公告)号：US20030210402A1

公开(公告)日：2003-11-13

申请号：US10353754

申请日：2003-01-28

Applicant: Applied Materials Israel Ltd.

Inventor： Alexander Libinson ,  Haim Feldman ,  Daniel Some ,  Boris Goldberg

IPC: G01B009/02

CPC classification number: G02B21/14 ,  G01N21/95607

Abstract: Apparatus for optical assessment of a sample includes a radiation source, adapted to generate a beam of coherent radiation, and traveling lens optics, adapted to focus the beam so as to generate first and second spots on a surface of the sample and to scan the spots together over the surface. The distance between the first and second spots is responsive to a pitch of a repetitive pattern of the sample. Collection optics are positioned to collect the radiation scattered from the first and second spots and to focus the collected radiation so as to generate an interference pattern. A detector detects a change in the interference pattern.

Abstract translation: 用于光学评估样本的装置包括适于产生相干辐射束的辐射源和适用于聚焦光束的行进透镜光学器件，以便在样品的表面上产生第一和第二斑点并扫描斑点 一起在表面。 第一和第二点之间的距离响应于样品的重复图案的间距。 收集光学器件被定位成收集从第一和第二点散射的辐射并聚焦所收集的辐射，以便产生干涉图案。 检测器检测干涉图案的变化。