公开(公告)号：US11022566B1

公开(公告)日：2021-06-01

申请号：US16836606

申请日：2020-03-31

Applicant: Applied Materials Israel Ltd.

Inventor： Dror Alumot ,  Shalom Elkayam ,  Shaul Cohen

IPC: G01N21/95 ,  G06F30/3308 ,  G06F30/398 ,  H01L21/67 ,  G06T7/13 ,  G06T7/136 ,  G06T7/00 ,  G06F119/02

Abstract: There is provided a system and method of examination of a semiconductor specimen using an examination recipe. The method includes obtaining a registered image pair, for each design-based structural element associated with a given layer, calculating an edge attribute, using a trained classifier to determine a class of the design-based structural element, and generating a layer score usable to determine validity of the registered image pair. There is also provided a system and method of generating the examination recipe usable for examination of a semiconductor specimen.