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公开(公告)号：US20190121331A1
公开(公告)日：2019-04-25
申请号：US16174070
申请日：2018-10-29
Applicant: Applied Materials Israel Ltd.
Inventor： Gadi Greenberg , Idan Kaizerman , Zeev Zohar
IPC: G05B19/418 , H01J37/00 , G06T7/00
Abstract: Inspection apparatus includes an imaging module, which is configured to capture images of defects at different, respective locations on a sample. A processor is coupled to process the images so as to automatically assign respective classifications to the defects, and to autonomously control the imaging module to continue capturing the images responsively to the assigned classifications.
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Patent Agency Ranking
公开(公告)号：US10901402B2
公开(公告)日：2021-01-26
申请号：US16174070
申请日：2018-10-29
Applicant: Applied Materials Israel Ltd.
Inventor： Gadi Greenberg , Idan Kaizerman , Zeev Zohar
IPC: G06T7/00 , G05B19/418 , H01J37/00 , H01L21/66
Abstract: Inspection apparatus includes an imaging module, which is configured to capture images of defects at different, respective locations on a sample. A processor is coupled to process the images so as to automatically assign respective classifications to the defects, and to autonomously control the imaging module to continue capturing the images responsively to the assigned classifications.
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公开(公告)号：US10114368B2
公开(公告)日：2018-10-30
申请号：US13948118
申请日：2013-07-22
Applicant: Applied Materials Israel Ltd.
Inventor： Gadi Greenberg , Idan Kaizerman , Zeev Zohar
IPC: G06K9/00 , G05B19/418 , H01J37/00 , G06T7/00 , H01L21/66
Abstract: Inspection apparatus includes an imaging module, which is configured to capture images of defects at different, respective locations on a sample. A processor is coupled to process the images so as to automatically assign respective classifications to the defects, and to autonomously control the imaging module to continue capturing the images responsively to the assigned classifications.
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公开(公告)号：US20150022654A1
公开(公告)日：2015-01-22
申请号：US13948118
申请日：2013-07-22
Applicant: Applied Materials Israel Ltd.
Inventor： Gadi Greenberg , Idan Kaizerman , Zeev Zohar
CPC classification number: G05B19/41875 , G05B2219/45031 , G05B2219/50064 , G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/00 , H01J2237/2817 , H01L22/20
Abstract: Inspection apparatus includes an imaging module, which is configured to capture images of defects at different, respective locations on a sample. A processor is coupled to process the images so as to automatically assign respective classifications to the defects, and to autonomously control the imaging module to continue capturing the images responsively to the assigned classifications.
Abstract translation: 检查装置包括成像模块，其被配置为在样本上的不同的相应位置捕获缺陷的图像。 耦合处理器以处理图像，以便自动分配对缺陷的分类，并且自动地控制成像模块以响应于所分配的分类继续捕获图像。
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公开(公告)号：US11263741B2
公开(公告)日：2022-03-01
申请号：US16752353
申请日：2020-01-24
Applicant: Applied Materials Israel Ltd.
Inventor： Boaz Cohen , Gadi Greenberg , Sivan Lifschitz , Shay Attal , Oded O. Dassa , Ziv Parizat
Abstract: Implementations of the disclosure provide methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods using in-die reference comprise finding similar blocks of a lithographic mask, the similar blocks are defined by similar CAD information. A comparison distance is selected based on (i) areas of the similar blocks and (ii) spatial relationships between the similar blocks. The similar blocks are aggregated, based on the comparison distance, to provide multiple aggregated areas; and comparable regions of the lithographic mask are defined based on the multiple aggregate blocks. Images of at least some of the comparable regions of the lithographic mask are acquired using an inspection module. The acquired images are compared.
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公开(公告)号：US20210233220A1
公开(公告)日：2021-07-29
申请号：US16752353
申请日：2020-01-24
Applicant: Applied Materials Israel Ltd.
Inventor： Boaz Cohen , Gadi Greenberg , Sivan Lifschitz , Shay Attal , Oded O. Dassa , Ziv Parizat
Abstract: Implementations of the disclosure provide methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods using in-die reference comprise finding similar blocks of a lithographic mask, the similar blocks are defined by similar CAD information. A comparison distance is selected based on (i) areas of the similar blocks and (ii) spatial relationships between the similar blocks. The similar blocks are aggregated, based on the comparison distance, to provide multiple aggregated areas; and comparable regions of the lithographic mask are defined based on the multiple aggregate blocks. Images of at least some of the comparable regions of the lithographic mask are acquired using an inspection module. The acquired images are compared.
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