SYSTEM AND METHODS OF GENERATING COMPARABLE REGIONS OF A LITHOGRAPHIC MASK

    公开(公告)号:US20210233220A1

    公开(公告)日:2021-07-29

    申请号:US16752353

    申请日:2020-01-24

    Abstract: Implementations of the disclosure provide methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods using in-die reference comprise finding similar blocks of a lithographic mask, the similar blocks are defined by similar CAD information. A comparison distance is selected based on (i) areas of the similar blocks and (ii) spatial relationships between the similar blocks. The similar blocks are aggregated, based on the comparison distance, to provide multiple aggregated areas; and comparable regions of the lithographic mask are defined based on the multiple aggregate blocks. Images of at least some of the comparable regions of the lithographic mask are acquired using an inspection module. The acquired images are compared.

    System and method for printability based inspection

    公开(公告)号:US09927375B2

    公开(公告)日:2018-03-27

    申请号:US14977379

    申请日:2015-12-21

    CPC classification number: G01N21/956 G01N21/8851 G01N2021/95676 G03F1/84

    Abstract: According to an embodiment of the invention there may be provided a system for assigning lithographic mask inspection process parameters. The system may include a search module, a decision module and a memory module. The memory module may be configured to store an expected image expected to be formed on a photoresist during a lithographic process that involves illuminating the lithographic mask. The search module may be configured to search in the expected image for printable features. The decision module may be configured to assign a first lithographic mask inspection process parameter to lithographic mask areas related to printable features and assign a second lithographic mask inspection process parameter to at least some lithographic mask areas that are not associated with printable features. The second lithographic mask inspection process parameter may differ from the first lithographic mask inspection process parameter.

    System and methods of generating comparable regions of a lithographic mask

    公开(公告)号:US11263741B2

    公开(公告)日:2022-03-01

    申请号:US16752353

    申请日:2020-01-24

    Abstract: Implementations of the disclosure provide methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods using in-die reference comprise finding similar blocks of a lithographic mask, the similar blocks are defined by similar CAD information. A comparison distance is selected based on (i) areas of the similar blocks and (ii) spatial relationships between the similar blocks. The similar blocks are aggregated, based on the comparison distance, to provide multiple aggregated areas; and comparable regions of the lithographic mask are defined based on the multiple aggregate blocks. Images of at least some of the comparable regions of the lithographic mask are acquired using an inspection module. The acquired images are compared.

    Overlay monitoring
    6.
    发明授权

    公开(公告)号:US11054753B1

    公开(公告)日:2021-07-06

    申请号:US16853586

    申请日:2020-04-20

    Abstract: A method for overlay monitoring including: obtaining a secondary electron image and a backscattered electron image of as area of the substrate in which an array of first structural elements are positioned at a surface of the substrate and a second array of second structural elements are positioned below the first array; determining locations of the first structural elements within the secondary electron image; defining regions of interest in the backscattered electron image, based on the locations of the first structural elements; processing pixels of the backscattered electron image that are located within the regions of interest to provide a backscattered electron representation of a second structural element; and calculating an overlay error based on location information regarding the second structural element within the backscattered electron representation of the second structural element and on location information regarding of at least one first structural element in the secondary electron image.

    SYSTEM AND METHOD FOR PRINTABILITY BASED INSPECTION

    公开(公告)号:US20170176347A1

    公开(公告)日:2017-06-22

    申请号:US14977379

    申请日:2015-12-21

    CPC classification number: G01N21/956 G01N21/8851 G01N2021/95676 G03F1/84

    Abstract: According to an embodiment of the invention there may be provided a system for assigning lithographic mask inspection process parameters. The system may include a search module, a decision module and a memory module. The memory module may be configured to store an expected image expected to be formed on a photoresist during a lithographic process that involves illuminating the lithographic mask. The search module may be configured to search in the expected image for printable features. The decision module may be configured to assign a first lithographic mask inspection process parameter to lithographic mask areas related to printable features and assign a second lithographic mask inspection process parameter to at least some lithographic mask areas that are not associated with printable features. The second lithographic mask inspection process parameter may differ from the first lithographic mask inspection process parameter.

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