公开(公告)号：US08890444B2

公开(公告)日：2014-11-18

申请号：US12653549

申请日：2009-12-15

申请人： Armin Heinz Hayn ,  Mohamed El-Gomati

发明人： Armin Heinz Hayn ,  Mohamed El-Gomati

IPC分类号： H01J29/51 ,  H01J37/063

CPC分类号： H01J37/063 ,  H01J2237/06308 ,  H01J2237/06341 ,  H01J2237/06375

摘要： An electron gun used in a particle beam device, for example in an electron microscope, has a relatively good brightness and may be operated under vacuum conditions which can be easily achieved (i.e., for example, at a residual pressure of about 10−6 or 10−7 mbar). The electron gun comprises an electron source having an electron emission surface. Furthermore, the electron gun comprises a first electrode configured to control a path of electrons emitted from the electron emission surface, a second electrode which is configured to suppress emissions of electrons from a side surface of the electron source and a third electrode configured to accelerate electrons emitted from the electron source to a final energy. A first voltage, a second voltage and a third voltage are adjusted to avoid any crossover of electrons emitted from the electron emission surface.

摘要翻译： 用于粒子束装置的电子枪例如在电子显微镜中具有相对较好的亮度，并且可以在容易实现的真空条件下操作（例如，在约10-6的残留压力或 10-7毫巴）。 电子枪包括具有电子发射表面的电子源。 此外，电子枪包括被配置为控制从电子发射表面发射的电子的路径的第一电极，被配置为抑制来自电子源的侧表面的电子的发射的第二电极和被构造成加速电子的第三电极 从电子源发射到最终能量。 调整第一电压，第二电压和第三电压以避免从电子发射表面发射的电子的任何交叉。

公开(公告)号：US20100127170A1

公开(公告)日：2010-05-27

申请号：US12306635

申请日：2006-06-30

申请人： Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

发明人： Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

IPC分类号： G01N23/225 ,  H01J29/46 ,  G21K1/08 ,  H01J35/06

CPC分类号： H01J37/065 ,  H01J35/06 ,  H01J2201/196 ,  H01J2237/06316 ,  H01J2237/3175

摘要： Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

摘要翻译： 提供了一种在电子束的发射侧具有2.0μm的曲率半径的锥形端的肖特基发射体。 由于曲率半径为1μm以上，电子枪的焦距可以比曲率半径在0.5μm以上0.6μm以下的现有技术中更长。 发现焦距与曲率半径成正比。 由于角电流强度（每单位立体角的射束电流）与电子枪焦距的平方成比例，所以前者可以在发射极半径的可行增加范围内提高一个数量级。 较高的角电流强度意味着可从电子枪获得的较大的束电流，并且本发明使肖特基发射体能够用于需要相对较高的微安电流束流的应用，如微焦X射线管，电子探针微量分析仪， 和电子束光刻系统。

公开(公告)号：US09257257B2

公开(公告)日：2016-02-09

申请号：US12306635

申请日：2006-06-30

申请人： Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

发明人： Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

IPC分类号： G01N23/00 ,  H01J37/065 ,  H01J35/06

CPC分类号： H01J37/065 ,  H01J35/06 ,  H01J2201/196 ,  H01J2237/06316 ,  H01J2237/3175

摘要： Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

摘要翻译： 提供了一种在电子束的发射侧具有2.0μm的曲率半径的锥形端的肖特基发射体。 由于曲率半径为1μm以上，电子枪的焦距可以比曲率半径在0.5μm以上0.6μm以下的现有技术中长。 发现焦距与曲率半径成正比。 由于角电流强度（每单位立体角的射束电流）与电子枪焦距的平方成比例，所以前者可以在发射极半径的可行增加范围内提高一个数量级。 较高的角电流强度意味着可从电子枪获得的较大的束电流，并且本发明使肖特基发射体能够用于需要相对较高的微安电流束流的应用，如微焦X射线管，电子探针微量分析仪， 和电子束光刻系统。