公开(公告)号：US20240212966A1

公开(公告)日：2024-06-27

申请号：US18391808

申请日：2023-12-21

申请人： Hitachi High-Tech Corporation

发明人： Tomoya IGARI ,  Masahiro FUKUTA ,  Takshi DOI

IPC分类号： H01J37/073 ,  H01J37/28

CPC分类号： H01J37/073 ,  H01J37/28 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/2817

摘要： Provided are a charged particle gun and a charged particle beam apparatus that can reduce instability in the amount of emitted charged particles and deviation in the charged particle trajectory when the amount of charged particle beams is increased. A charged particle gun includes a charged particle source that generates a charged particle, an electrode portion that includes an extraction electrode for extracting a charged particle beam from the charged particle source, a voltage introduction unit that introduces voltage to the electrode portion, and a temperature adjustment unit that adjusts a temperature of the electrode portion. The temperature adjustment unit is configured to adjust the temperature of the electrode portion based on a change in a state of the electrode portion.

公开(公告)号：US20230335376A1

公开(公告)日：2023-10-19

申请号：US17723722

申请日：2022-04-19

申请人： Applied Materials, Inc.

发明人： Yang YANG ,  Fernando SILVEIRA ,  Kartik RAMASWAMY ,  Yue GUO ,  A N M Wasekul AZAD ,  Imad YOUSIF

IPC分类号： H01J37/32

CPC分类号： H01J37/32082 ,  H01J37/32348 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32733 ,  H01J2237/06375 ,  H01J2237/2007

摘要： Apparatus provide plasma to a processing volume of a chamber. The Apparatus may comprise a plurality of plasma sources, each with at least a dielectric tube inlet which is at least partially surrounded by a conductive tube which is configured to be connected to RF power to generate plasma and a gas inlet positioned opposite the dielectric tube inlet for a process gas and a dielectric tube directly connected to each of the plurality of plasma sources where the dielectric tube is configured to at least partially contain plasma generated by the plurality of plasma sources and to release radicals generated in the plasma via holes in the dielectric tube.

公开(公告)号：US20190237288A1

公开(公告)日：2019-08-01

申请号：US16259827

申请日：2019-01-28

申请人： IMS Nanofabrication GmbH

发明人： Elmar Platzgummer ,  Mattia Capriotti ,  Christoph Spengler

IPC分类号： H01J37/063 ,  H01J37/305 ,  H01J37/065 ,  H01J37/147 ,  H01J37/30

CPC分类号： H01J37/063 ,  H01J37/065 ,  H01J37/1477 ,  H01J37/3007 ,  H01J37/3056 ,  H01J2237/06375

摘要： A charged-particle source for emission of electrons or other electrically charged particles comprises, located between the emitter electrode having an emitter surface and a counter electrode, at least two adjustment electrodes; a pressure regulator device is configured to control the gas pressure in the source space at a pre-defined pressure value. In a first cleaning mode of the particle source, applying a voltage between the emitter and counter electrodes directs gas particles towards the counter electrode, generating secondary electrons which ionize particles of the gas in the source space, and electrostatic potentials are applied to at least some of the adjustment electrodes, generating an electric field directing the ionized gas particles onto the emitter surface.

公开(公告)号：US20170213685A1

公开(公告)日：2017-07-27

申请号：US15233198

申请日：2016-08-10

申请人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

发明人： Jun Tae KANG ,  Yoon-Ho SONG ,  Jae-Woo KIM ,  Jin-Woo JEONG

IPC分类号： H01J35/06

CPC分类号： H01J37/063 ,  H01J7/18 ,  H01J7/186 ,  H01J9/39 ,  H01J19/48 ,  H01J21/20 ,  H01J29/46 ,  H01J29/488 ,  H01J29/50 ,  H01J35/06 ,  H01J35/065 ,  H01J35/165 ,  H01J35/20 ,  H01J2201/196 ,  H01J2201/317 ,  H01J2209/385 ,  H01J2209/3893 ,  H01J2229/4827 ,  H01J2229/4831 ,  H01J2229/94 ,  H01J2235/068 ,  H01J2235/205 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/06375 ,  H01J2237/1825

摘要： Disclosed is an x-ray tube including a hybrid electron emission source, which uses, as an electron emission source, a cathode including both a field electron emission source and a thermal electron emission source. An x-ray tube includes an electron emission source emitting an electron beam, and a target part including a target material that emits an x-ray as the emitted electron beam collides with the target part, wherein the electron emission source includes a thermal electron emission source and a field electron emission source, and emits the electron beam by selectively using at least one of the thermal electron emission source and the field electron emission source.

公开(公告)号：US20170125203A1

公开(公告)日：2017-05-04

申请号：US15404618

申请日：2017-01-12

申请人： Hermes Microvision Inc.

发明人： Shuai Li

IPC分类号： H01J37/143

CPC分类号： H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

摘要： This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20160104597A1

公开(公告)日：2016-04-14

申请号：US14787263

申请日：2014-04-14

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Yuta IMAI ,  Takashi OHSHIMA ,  Hideo MORISHITA

IPC分类号： H01J37/073 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J29/48 ,  H01J27/02

CPC分类号： H01J37/073 ,  H01J27/02 ,  H01J27/26 ,  H01J29/481 ,  H01J37/06 ,  H01J37/063 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0802 ,  H01J2237/1508 ,  H01J2237/2007 ,  H01J2237/2801

摘要： The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

摘要翻译： 本发明的目的是提供一种仅使用静电透镜的带电粒子枪，所述带电粒子枪相对较小并且具有较小的像差，并且提供即使具有高电流也具有高亮度的场致发射型带电粒子枪 。 该带电粒子枪具有：带电粒子源; 加速电极，其加速从带电粒子源发射的带电粒子; 控制电极，其设置成比加速电极更加朝向带电粒子源侧，并且具有比加速电极的开口直径大的孔径; 以及控制单元，其基于对加速电极施加的电位控制施加到控制电极的电位。

公开(公告)号：US20160071702A1

公开(公告)日：2016-03-10

申请号：US14773573

申请日：2013-10-29

申请人： Shimadzu Corporation

发明人： Masayasu SUZUKI ,  Yosuke MORIMOTO

IPC分类号： H01J37/32

CPC分类号： H01J37/32669 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32568 ,  H01J37/32596 ,  H01J37/3266 ,  H01J37/32899 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/06375 ,  H01J2237/152 ,  H01J2237/162 ,  H01J2237/327 ,  H01J2237/3326

摘要： An arc-plasma film formation device includes a film formation chamber in which a substrate to be treated is stored, a plasma chamber in which at least a part of a target is stored, the plasma chamber being configured to be connected to the film formation chamber, and a plurality of hollow coils configured to generate a continuous line of magnetic force between the target and the film formation chamber and having at least one curved section, the plurality of hollow coils being arrange in the plasma chamber and covered by an outer coat made of a non-magnetic metal. Plasma containing ions derived from the target material and generated in the plasma chamber as a result of arc discharge is transported from the target to the substrate by passing an inside of the plurality of hollow coils.

摘要翻译： 电弧等离子体成膜装置包括：成膜室，其中存储有待处理的基板;等离子体室，其中存储有至少一部分靶;等离子体室被配置为连接到成膜室 以及多个中空线圈，其被配置为在所述靶和成膜室之间产生连续的磁力线，并且具有至少一个弯曲部分，所述多个中空线圈布置在所述等离子体室中并被外部涂层覆盖 的非磁性金属。 通过使多个中空线圈的内部通过，从目标材料产生并在等离子体室中产生的由于电弧放电而产生的等离子体从目标物传送到基板。

公开(公告)号：US08890444B2

公开(公告)日：2014-11-18

申请号：US12653549

申请日：2009-12-15

申请人： Armin Heinz Hayn ,  Mohamed El-Gomati

发明人： Armin Heinz Hayn ,  Mohamed El-Gomati

IPC分类号： H01J29/51 ,  H01J37/063

CPC分类号： H01J37/063 ,  H01J2237/06308 ,  H01J2237/06341 ,  H01J2237/06375

摘要： An electron gun used in a particle beam device, for example in an electron microscope, has a relatively good brightness and may be operated under vacuum conditions which can be easily achieved (i.e., for example, at a residual pressure of about 10−6 or 10−7 mbar). The electron gun comprises an electron source having an electron emission surface. Furthermore, the electron gun comprises a first electrode configured to control a path of electrons emitted from the electron emission surface, a second electrode which is configured to suppress emissions of electrons from a side surface of the electron source and a third electrode configured to accelerate electrons emitted from the electron source to a final energy. A first voltage, a second voltage and a third voltage are adjusted to avoid any crossover of electrons emitted from the electron emission surface.

摘要翻译： 用于粒子束装置的电子枪例如在电子显微镜中具有相对较好的亮度，并且可以在容易实现的真空条件下操作（例如，在约10-6的残留压力或 10-7毫巴）。 电子枪包括具有电子发射表面的电子源。 此外，电子枪包括被配置为控制从电子发射表面发射的电子的路径的第一电极，被配置为抑制来自电子源的侧表面的电子的发射的第二电极和被构造成加速电子的第三电极 从电子源发射到最终能量。 调整第一电压，第二电压和第三电压以避免从电子发射表面发射的电子的任何交叉。

公开(公告)号：USRE45049E1

公开(公告)日：2014-07-29

申请号：US13343038

申请日：2012-01-04

申请人： Marco Jan-Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent Van Veen ,  Pieter Kruit

发明人： Marco Jan-Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent Van Veen ,  Pieter Kruit

IPC分类号： H01J37/30 ,  H01J37/304

CPC分类号： H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

公开(公告)号：US08723138B2

公开(公告)日：2014-05-13

申请号：US13369340

申请日：2012-02-09

申请人： Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

发明人： Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

IPC分类号： H01J37/065

CPC分类号： H01J37/065 ,  H01J1/3044 ,  H01J37/06 ,  H01J2201/30415 ,  H01J2201/30446 ,  H01J2201/30476 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  Y10T29/49888

摘要： A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

摘要翻译： 电子束源的尖端包括承载涂层的芯。 该涂层由具有比形成芯的表面的材料更大的导电性的材料形成。