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公开(公告)号:US20080100983A1
公开(公告)日:2008-05-01
申请号:US11582814
申请日:2006-10-18
申请人: Ashwin M. Purohit , Dale Stone , Dave Broyer , Steve Drummond
发明人: Ashwin M. Purohit , Dale Stone , Dave Broyer , Steve Drummond
IPC分类号: H01T23/00
CPC分类号: H01L21/6831 , Y10S414/141
摘要: The present invention is directed to a system and a method for peeling a wafer off of an electrostatic clamp (ESC). The ESC removal system comprises a electrostatic clamp and a wafer electrically coupled and physically in contact with each other. A plurality of grippers or pins are arranged with respect to the wafer and the ESC to allow the wafer to be peeled off or removed section by section from the electrostatic clamp. The system and method allow the wafer to be removed with a much lower pull force than current systems and methods.
摘要翻译: 本发明涉及一种用于从静电夹(ESC)剥离晶片的系统和方法。 ESC去除系统包括电耦合和物理上彼此接触的静电夹和晶片。 相对于晶片和ESC布置多个夹持器或销,以允许晶片从静电夹具逐个剥离或逐个移除。 该系统和方法允许以比当前系统和方法更低的拉力去除晶片。
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公开(公告)号:US07751172B2
公开(公告)日:2010-07-06
申请号:US11582814
申请日:2006-10-18
申请人: Ashwin M. Purohit , Dale Stone , Dave Broyer , Steve Drummond
发明人: Ashwin M. Purohit , Dale Stone , Dave Broyer , Steve Drummond
IPC分类号: H01L21/683
CPC分类号: H01L21/6831 , Y10S414/141
摘要: The present invention is directed to a system and a method for peeling a wafer off of an electrostatic clamp (ESC). The ESC removal system comprises a electrostatic clamp and a wafer electrically coupled and physically in contact with each other. A plurality of grippers or pins are arranged with respect to the wafer and the ESC to allow the wafer to be peeled off or removed section by section from the electrostatic clamp. The system and method allow the wafer to be removed with a much lower pull force than current systems and methods.
摘要翻译: 本发明涉及一种用于从静电夹(ESC)剥离晶片的系统和方法。 ESC去除系统包括电耦合和物理上彼此接触的静电夹和晶片。 相对于晶片和ESC布置多个夹持器或销,以允许晶片从静电夹具逐个剥离或逐个移除。 该系统和方法允许以比当前系统和方法更低的拉力去除晶片。
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3.
公开(公告)号:US20110291023A1
公开(公告)日:2011-12-01
申请号:US13116661
申请日:2011-05-26
IPC分类号: B01J19/08
CPC分类号: H01J37/20 , H01J37/3171 , H01J2237/166 , H01J2237/2001 , H01J2237/20214
摘要: A workpiece scanning system is provided having a scan arm that rotates about a first axis and a chilled end effector rotatably coupled to the scan arm about a second axis for selectively securing a workpiece. The chilled end effector has a clamping plate and one or more cooling mechanisms for cooling the clamping plate. A bearing is positioned along the second axis and rotatably couples the end effector to the scan arm, and a seal is positioned along the second axis to provide a pressure barrier between an external environment and an internal environment. One or more of the bearing and seal can have a ferrofluid associated therewith. A heater assembly is positioned proximate to the bearing and seal, wherein the heater assembly selectively provides a predetermined amount of heat to the bearing and seal, therein increasing a propensity of the end effector to rotate about the second axis.
摘要翻译: 提供了一种工件扫描系统,其具有围绕第一轴线旋转的扫描臂以及围绕第二轴可旋转地联接到扫描臂的冷冻末端执行器,用于选择性地固定工件。 冷冻末端执行器具有夹紧板和用于冷却夹紧板的一个或多个冷却机构。 轴承沿着第二轴线定位并且将端部执行器可旋转地联接到扫描臂,并且沿着第二轴线定位密封件以在外部环境和内部环境之间提供压力障碍。 轴承和密封件中的一个或多个可以具有与其相关联的铁磁流体。 加热器组件靠近轴承和密封定位,其中加热器组件选择性地向轴承和密封提供预定量的热量,其中增加端部执行器围绕第二轴线旋转的倾向。
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公开(公告)号:US09711324B2
公开(公告)日:2017-07-18
申请号:US13485186
申请日:2012-05-31
申请人: William D. Lee , Steve Drummond
发明人: William D. Lee , Steve Drummond
IPC分类号: H01J37/18 , H01J37/317
CPC分类号: H01J37/185 , H01J37/3171 , H01J2237/022 , H01J2237/184 , H01J2237/2001 , H01J2237/31701
摘要: An ion implantation system provides ions to a workpiece positioned in a process environment of a process chamber on a sub-ambient temperature chuck. An intermediate chamber having an intermediate environment is in fluid communication with an external environment and has a cooling station and heating station for cooling and heating the workpiece. A load lock chamber is provided between the process chamber and intermediate chamber to isolate the process environment from the intermediate environment. A positive pressure source provides a dry gas within the intermediate chamber at dew point that is less than a dew point of the external environment to the intermediate chamber. The positive pressure source isolates the intermediate environment from the external environment via a flow of the dry gas from the intermediate chamber to the external environment.
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公开(公告)号:US20130320208A1
公开(公告)日:2013-12-05
申请号:US13485186
申请日:2012-05-31
申请人: William D. Lee , Steve Drummond
发明人: William D. Lee , Steve Drummond
CPC分类号: H01J37/185 , H01J37/3171 , H01J2237/022 , H01J2237/184 , H01J2237/2001 , H01J2237/31701
摘要: An ion implantation system provides ions to a workpiece positioned in a process environment of a process chamber on a sub-ambient temperature chuck. An intermediate chamber having an intermediate environment is in fluid communication with an external environment and has a cooling station and heating station for cooling and heating the workpiece. A load lock chamber is provided between the process chamber and intermediate chamber to isolate the process environment from the intermediate environment. A positive pressure source provides a dry gas within the intermediate chamber at dew point that is less than a dew point of the external environment to the intermediate chamber. The positive pressure source isolates the intermediate environment from the external environment via a flow of the dry gas from the intermediate chamber to the external environment.
摘要翻译: 离子注入系统向位于次环境温度卡盘上的处理室的处理环境中的工件提供离子。 具有中间环境的中间室与外部环境流体连通,具有用于冷却和加热工件的冷却站和加热站。 在处理室和中间室之间设置负载锁定室,以将过程环境与中间环境隔离。 正压源在中间室内的露点处提供干燥气体,其露点小于外部环境对中间室的露点。 正压源通过干气从中间室流向外部环境,将中间环境与外部环境隔离开来。
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6.
公开(公告)号:US08692215B2
公开(公告)日:2014-04-08
申请号:US13116661
申请日:2011-05-26
CPC分类号: H01J37/20 , H01J37/3171 , H01J2237/166 , H01J2237/2001 , H01J2237/20214
摘要: A workpiece scanning system is provided having a scan arm that rotates about a first axis and a chilled end effector rotatably coupled to the scan arm about a second axis for selectively securing a workpiece. The chilled end effector has a clamping plate and one or more cooling mechanisms for cooling the clamping plate. A bearing is positioned along the second axis and rotatably couples the end effector to the scan arm, and a seal is positioned along the second axis to provide a pressure barrier between an external environment and an internal environment. One or more of the bearing and seal can have a ferrofluid associated therewith. A heater assembly is positioned proximate to the bearing and seal, wherein the heater assembly selectively provides a predetermined amount of heat to the bearing and seal, therein increasing a propensity of the end effector to rotate about the second axis.
摘要翻译: 提供了一种工件扫描系统,其具有围绕第一轴线旋转的扫描臂以及围绕第二轴可旋转地联接到扫描臂的冷冻末端执行器,用于选择性地固定工件。 冷冻末端执行器具有夹紧板和用于冷却夹紧板的一个或多个冷却机构。 轴承沿着第二轴线定位并且将端部执行器可旋转地联接到扫描臂,并且沿着第二轴线定位密封件以在外部环境和内部环境之间提供压力障碍。 轴承和密封件中的一个或多个可以具有与其相关联的铁磁流体。 加热器组件靠近轴承和密封定位,其中加热器组件选择性地向轴承和密封提供预定量的热量,其中增加端部执行器围绕第二轴线旋转的倾向。
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