摘要:
An electronic imaging apparatus includes a connecting section connected to an optical apparatus; an optical element having a preset transmittance with respect to light in a preset wavelength region, incident from the optical apparatus; and an electronic image sensor receiving the light transmitted through the optical element.
摘要:
An electronic imaging apparatus includes a connecting section connected to an optical apparatus; an optical element having a preset transmittance with respect to light in a preset wavelength region, incident from the optical apparatus; and an electronic image sensor receiving the light transmitted through the optical element.
摘要:
An electronic imaging apparatus includes a connecting section connected to an optical apparatus; an optical element having a preset transmittance with respect to light in a preset wavelength region, incident from the optical apparatus; and an electronic image sensor receiving the light transmitted through the optical element.
摘要:
A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength λ being “(0.13˜0.35)×λ/4” for the first layer, “(0.18˜0.75)×λ/4” for the second layer, “(0.28˜2.31)×λ/4” for the third layer, “(0.26˜0.92)×λ/4” for the fourth layer, “(0.20˜0.37)×λ/4” for the fifth layer, and “(1.09˜1.18)×λ/4” for the sixth layer.
摘要:
A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength λ being “(0.13˜0.35)×λ/4” for the first layer, “(0.18˜0.75)×λ/4” for the second layer, “(0.28˜2.31)×λ/4” for the third layer, “(0.26˜0.92)×λ/4” for the fourth layer, “(0.20˜0.37)×λ/4” for the fifth layer, and “(1.09˜1.18)×λ/4” for the sixth layer.
摘要:
Microscope apparatus and a method are disclosed for avoiding a reduction in intensity at the periphery of a microscope image that is detected by an electronic image-detector and then displayed. The method includes inserting one or more stops along the optical axis of the microscope, said stop(s) having a central transmissive region and a blocking region outside the central transmissive region; and positioning at least one stop so as to simultaneously block peripheral portions of axial and abaxial light fluxes from a sample under observation from being incident onto the electronic image detector, thereby making the axial and abaxial light fluxes that are incident onto the electronic image detector substantially equal in detected brightness. The apparatus disclosed is for implementing the method, and includes a relay optical system, a middle barrel of a microscope, and one or more stops as described above which simultaneously block peripheral portions of axial and abaxial light fluxes from a sample under observation from being passed by the middle barrel.
摘要:
An observation or measurement device has, at least, an infinity-corrected objective lens and an imaging lens, and satisfies a condition, 4.56≦D·NA′≦30 (mm), where D is the parfocal distance of the objective lens and NA′ is the numerical aperture of the imaging lens. It is desirable to make a distance from the mount position of the objective lens to the most object-side surface of the imaging lens variable and to satisfy a condition, 0.5 FL
摘要:
A culture microscope apparatus has an illumination unit to apply excitation light to the specimen, a specimen observing portion to observe light generated from the specimen due to the excitation light, and a dimmer unit to dim the excitation light that has penetrated the specimen.
摘要:
An image pickup apparatus has an image sensor recording image information; a dustproof glass for keeping hermeticity of the periphery of the image sensor, placed in front of the image sensor; an optical filter removably placed in front of the dustproof glass; and a camera mount placed in front of the optical filter. The image pickup apparatus further has a parfocal adjusting device in which a focal position where the optical filter is demounted can be adjusted so as to be nearly equal to the focal position where the optical filter is mounted.
摘要:
An image pickup apparatus has an image sensor recording image information; a dustproof glass for keeping hermeticity of the periphery of the image sensor, placed in front of the image sensor; an optical filter removably placed in front of the dustproof glass; and a camera mount placed in front of the optical filter. The image pickup apparatus further has a parfocal adjusting device in which a focal position where the optical filter is demounted can be adjusted so as to be nearly equal to the focal position where the optical filter is mounted.