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Patent Agency Ranking
公开(公告)号：US11728140B1
公开(公告)日：2023-08-15
申请号：US17588999
申请日：2022-01-31
Applicant: Axcelis Technologies, Inc.
Inventor： Neil J. Bassom , Joshua Abeshaus , David Sporleder , Neil Colvin , Joseph Valinski , Michael Cristoforo , Vladimir Romanov , Pradeepa Kowrikan Subrahmnya
CPC classification number: H01J37/32412 , H01J37/08
Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.
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公开(公告)号：US12154763B2
公开(公告)日：2024-11-26
申请号：US18336337
申请日：2023-06-16
Applicant: Axcelis Technologies, Inc.
Inventor： Neil J. Bassom , Joshua Abeshaus , David Sporleder , Neil Colvin , Joseph Valinski , Michael Cristoforo , Vladimir Romanov , Pradeepa Kowrikan Subrahmnya
Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.
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公开(公告)号：US20230245859A1
公开(公告)日：2023-08-03
申请号：US17588999
申请日：2022-01-31
Applicant: Axcelis Technologies, Inc.
Inventor： Neil J. Bassom , Joshua Abeshaus , David Sporleder , Neil Colvin , Joseph Valinski , Michael Cristoforo , Vladimir Romanov , Pradeepa Kowrikan Subrahmnya
CPC classification number: H01J37/32412 , H01J37/08
Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.
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4.发明公开公开(公告)号：US20230235449A1
公开(公告)日：2023-07-27
申请号：US18084705
申请日：2022-12-20
Applicant: Axcelis Technologies, Inc.
Inventor： David M. Burtner , Neil J. Bassom
IPC: C23C14/48 , C23C14/06 , H01J37/317
CPC classification number: C23C14/48 , C23C14/0605 , H01J37/3171 , H01J2237/022 , H01J2237/31705
Abstract: An ion source for an ion implantation system is configured to form an ion beam from a predetermined species along a beamline, where the ion beam is at an initial energy. A deceleration component is configured to decelerate the ion beam to a final energy that is less than the initial energy. A workpiece support is configured to support a workpiece along a workpiece plane downstream of the deceleration component along the beamline. A beamline component is positioned downstream of the deceleration component along the beamline. The beamline component has a feature that is at least partially impinged by the ion beam, and where the feature has a surface having a predetermined angle of incidence with respect to the ion beam. The predetermined angle of incidence provides a predetermined sputter yield of the ion beam at the final energy that mitigates deposition of the ion species on the beamline component.
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公开(公告)号：US20230343558A1
公开(公告)日：2023-10-26
申请号：US18336337
申请日：2023-06-16
Applicant: Axcelis Technologies, Inc.
Inventor： Neil J. Bassom , Joshua Abeshaus , David Sporleder , Neil Colvin , Joseph Valinski , Michael Cristoforo , Vladimir Romanov , Pradeepa Kowrikan Subrahmnya
CPC classification number: H01J37/32412 , H01J37/08
Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.
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