公开(公告)号：US20190003049A1

公开(公告)日：2019-01-03

申请号：US16063603

申请日：2017-01-17

Applicant: BASF SE

Inventor： Falko ABELS ,  Daniel LOEFFLER ,  Hagen WILMER ,  Robert WOLF ,  Christian ROEDL ,  Philipp BUESCHELBERGER

IPC: C23C16/448 ,  C07F15/06

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state Ln . . . M . . . Xm (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.