公开(公告)号：US20190144781A1

公开(公告)日：2019-05-16

申请号：US16307191

申请日：2017-05-31

Applicant: BASF SE

Inventor： Christian DAESCHLEIN ,  Max SIEBERT ,  Michael LAUTER ,  Leonardus LEUNISSEN ,  Ivan GARCIA ROMERO ,  Haci Osman GUEVENC ,  Peter PRZYBYLSKI ,  Julian PROELSS ,  Andreas KLIPP

IPC: C11D1/72 ,  C11D1/722 ,  C11D11/00 ,  C11D3/37 ,  H05K3/26

Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general formula (I) and mixtures thereof, formula (I) wherein R1 and R3 are idependently from each other hydrogen, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-Butyl, or sec-butyl, R2 is methyl and x and y are an integer,1 (B)poly(acrylic acid) (PAA) oracrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C)water, wherein the pH of the composition is in the range of from 7.0 to 10.5.