公开(公告)号：US10787738B2

公开(公告)日：2020-09-29

申请号：US16063603

申请日：2017-01-17

Applicant: BASF SE

Inventor： Falko Abels ,  Daniel Loeffler ,  Hagen Wilmer ,  Robert Wolf ,  Christian Roedl ,  Philipp Bueschelberger

IPC: C23C16/18 ,  C23C16/448 ,  C07F15/06 ,  C23C16/455 ,  C07F9/6568 ,  C23C16/34 ,  C23C16/40 ,  C01B21/06 ,  C01G51/04 ,  C01G53/04

Abstract: Processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, a process of bringing a compound of general formula (I) into the gaseous or aerosol state Ln - - - M - - - Xm  (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.