Composition comprising an alkanesulfonic acid for dissolving and/or inhibiting deposition of scale on a surface of a system
    1.
    发明授权
    Composition comprising an alkanesulfonic acid for dissolving and/or inhibiting deposition of scale on a surface of a system 有权
    包含用于溶解和/或抑制垢在系统表面沉积的烷基磺酸的组合物

    公开(公告)号:US08648026B2

    公开(公告)日:2014-02-11

    申请号:US13688819

    申请日:2012-11-29

    Applicant: BASF SE

    Abstract: A composition for dissolving and/or inhibiting deposition of scale on a surface of a system comprises an acidic component, a wetting agent, and a corrosion inhibitor. The composition may further comprise water. The acidic component comprises an alkanesulfonic acid, e.g. methanesulfonic acid (MSA). The wetting agent comprises a surfactant. The corrosion inhibitor comprises an amphoteric surfactant. The alkanesulfonic acid is present in an amount of at least about 50 weight percent (wt %), the surfactant is present in an amount of from about 0.1 to about 30 wt %, and the amphoteric surfactant is present in an amount of from about 0.025 to about 20 wt %, each based on 100 wt % of the alkanesulfonic acid, the surfactant, and the amphoteric surfactant combined. A method of dissolving and/or inhibiting deposition of scale on the surface of the system comprises the step of contacting the surface of the system with the composition.

    Abstract translation: 用于溶解和/或抑制垢在体系表面沉积的组合物包含酸性组分,润湿剂和腐蚀抑制剂。 组合物还可以包含水。 酸性组分包括烷烃磺酸,例如 甲磺酸(MSA)。 润湿剂包括表面活性剂。 腐蚀抑制剂包括两性表面活性剂。 链烷磺酸以至少约50重量%(wt%)的量存在,表面活性剂的存在量为约0.1至约30重量%,两性表面活性剂的存在量为约0.025 至约20重量%,各自基于100重量%的烷基磺酸,表面活性剂和两性表面活性剂组合。 在系统表面上溶解和/或抑制垢的沉积的方法包括使系统的表面与组合物接触的步骤。

    COMPOSITION FOR DISSOLVING AND/OR INHIBITING DEPOSITION OF SCALE ON A SURFACE OF A SYSTEM
    2.
    发明申请
    COMPOSITION FOR DISSOLVING AND/OR INHIBITING DEPOSITION OF SCALE ON A SURFACE OF A SYSTEM 有权
    用于溶解和/或抑制系统表面沉积沉积的组合物

    公开(公告)号:US20130137622A1

    公开(公告)日:2013-05-30

    申请号:US13688819

    申请日:2012-11-29

    Applicant: BASF SE

    Abstract: A composition for dissolving and/or inhibiting deposition of scale on a surface of a system comprises an acidic component, a wetting agent, and a corrosion inhibitor. The composition may further comprise water. The acidic component comprises an alkanesulfonic acid, e.g. methanesulfonic acid (MSA). The wetting agent comprises a surfactant. The corrosion inhibitor comprises an amphoteric surfactant. The alkanesulfonic acid is present in an amount of at least about 50 weight percent (wt %), the surfactant is present in an amount of from about 0.1 to about 30 wt %, and the amphoteric surfactant is present in an amount of from about 0.025 to about 20 wt %, each based on 100 wt % of the alkanesulfonic acid, the surfactant, and the amphoteric surfactant combined. A method of dissolving and/or inhibiting deposition of scale on the surface of the system comprises the step of contacting the surface of the system with the composition.

    Abstract translation: 用于溶解和/或抑制垢在体系表面沉积的组合物包含酸性组分,润湿剂和腐蚀抑制剂。 组合物还可以包含水。 酸性组分包括烷烃磺酸,例如 甲磺酸(MSA)。 润湿剂包括表面活性剂。 腐蚀抑制剂包括两性表面活性剂。 链烷磺酸以至少约50重量%(wt%)的量存在,表面活性剂的存在量为约0.1至约30重量%,两性表面活性剂的存在量为约0.025 至约20重量%,各自基于100重量%的烷基磺酸,表面活性剂和两性表面活性剂组合。 在系统表面上溶解和/或抑制垢的沉积的方法包括使系统的表面与组合物接触的步骤。

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