公开(公告)号：US10300496B2

公开(公告)日：2019-05-28

申请号：US15112788

申请日：2015-01-22

申请人： BASF SE ,  BASF Corporation

发明人： Florian Blasberg ,  Andreas Luz ,  Igor Shishkov ,  David J. Gilbert ,  Wolfgang Rohde

IPC分类号： B01D15/38 ,  B03C1/01 ,  B01J20/32 ,  C02F1/28 ,  C02F1/48 ,  B01J20/10 ,  C02F1/52 ,  C02F1/54 ,  C02F1/56 ,  B22F1/00 ,  C09C1/24 ,  B01J20/28 ,  H01F1/33 ,  B22F1/02 ,  G01N1/40 ,  H01F1/03 ,  C09C1/62 ,  C09C3/12

摘要： The present invention relates to core-shell-particles, wherein the core comprises at least one metal, or a compound thereof, or a mixture of at least one metal or a compound thereof and at least one semimetal or a compound thereof, and the shell comprises at least one silicon comprising polymer, to a process for the preparation of these core-shell-particles, to the use of these core-shell-particles in an agglomeration-deagglomeration process, in particular in chemical, physical or biological test methods or separation processes, decontamination processes, water purification, recycling of electrical/electronic scrap or gravity separation, and to a process for separating at least one first material from a mixture comprising this at least one first material and at least one second material.

公开(公告)号：US10570514B2

公开(公告)日：2020-02-25

申请号：US15779570

申请日：2016-11-29

申请人： BASF SE

发明人： Falko Abels ,  David Dominique Schweinfurth ,  Karl Matos ,  Daniel Loeffler ,  Maraike Ahlf ,  Florian Blasberg ,  Thomas Schaub ,  Jan Spielmann ,  Axel Kirste ,  Boris Gaspar

IPC分类号： C23C16/455 ,  C23C16/06 ,  C07F9/6584 ,  C07F9/50 ,  C07F7/10 ,  C07F9/52

摘要： The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

公开(公告)号：US10106888B2

公开(公告)日：2018-10-23

申请号：US15501631

申请日：2015-07-24

申请人： BASF SE

发明人： Julia Strautmann ,  Rocco Paciello ,  Thomas Schaub ,  Kerstin Schierle-Arndt ,  Daniel Loeffler ,  Hagen Wilmer ,  Felix Eickemeyer ,  Florian Blasberg ,  Carolin Limburg

IPC分类号： C23C16/06 ,  C23C16/18 ,  C23C16/455

摘要： A process of bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.