专利检索 ap:("BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD") AND inv:"Meng YANG" 第 1 页

1.

发明申请
METHOD OF OPERATING SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICES 审中-公开

公开(公告)号：US20180158656A1

公开(公告)日：2018-06-07

申请号：US15866878

申请日：2018-01-10

申请人： BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD

发明人： Jinrong ZHAO , Shaohua LIU , Gang WEI , Yulin PENG , Meng YANG , Yali FU

IPC分类号： H01J37/32 , H01L29/78 , H01L21/687

CPC分类号： H01J37/32715 , H01J37/3211 , H01J37/32183 , H01J37/32477 , H01J37/32816 , H01J37/32834 , H01L21/3065 , H01L21/68714 , H01L29/78 , H01L29/785

摘要： Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wall. The bottom side includes gas passages for plasma particles to pass through the liner.