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1.发明授权公开(公告)号：US11094789B2
公开(公告)日：2021-08-17
申请号：US16497658
申请日：2019-04-12
发明人： Xiaolong Li , Jinchao Bai , Huibin Guo , Xiao Han , Yongzhi Song
IPC分类号： H01L29/417 , H01L27/32 , H01L29/40 , H01L29/66 , H01L29/786 , H01L21/3213 , H01L27/12 , H01L29/45
摘要： Embodiments of the present disclosure disclose a thin film transistor, a method for manufacturing a thin film transistor, an array substrate, and a display device. The thin film transistor includes a source electrode and a drain electrode, each of the source electrode and the drain electrode including a metal substrate and a conductive layer covering the metal substrate. An adhesion between the conductive layer and a photoresist material is larger than an adhesion between the metal substrate and the photoresist material. The metal substrate and the conductive layer are both formed on a base substrate, an orthographic projection of the conductive layer on the base substrate covers an orthographic projection of the metal substrate on the base substrate, and. an area of the orthographic projection of the conductive layer on the base substrate is larger than an area of the orthographic projection of the metal substrate on the base substrate.
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公开(公告)号：US11360378B2
公开(公告)日：2022-06-14
申请号：US16346192
申请日：2018-11-01
发明人： Xiaoxiang Zhang , Mingxuan Liu , Huibin Guo , Wenqing Xu , Xiaolong Li , Zumou Wu , Yongzhi Song
摘要： A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion (02) on the substrate (01). The wiring light shielding portion (02) includes a light shielding region (021) and a phase shift region (022). In a direction perpendicular to the extending direction of the wiring light shielding portion (02) a width of the light shielding region (021) is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion (02).
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公开(公告)号：US11054737B2
公开(公告)日：2021-07-06
申请号：US16106155
申请日：2018-08-21
发明人： Xiaoxiang Zhang , Huibin Guo , Yongzhi Song , Mingxuan Liu , Wenqing Xu , Xiaolong Li , Zumou Wu
摘要： Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.
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公开(公告)号：US11280681B2
公开(公告)日：2022-03-22
申请号：US16563110
申请日：2019-09-06
发明人： Jinchao Bai , Xun Wang , Zumou Wu , Xiaolong Li , Tianyu Zuo , Xiangqian Ding
摘要： The present disclosure relates to a flexible temperature sensor, a method for preparing the same, and a flexible device. The flexible temperature sensor includes: a flexible substrate; an electrode arranged on the flexible substrate; a mixed fluid arranged on the flexible substrate and in contact with the electrode, in which the mixed fluid includes an ionic liquid and porous conductive particles; and a protective plate arranged on a surface of the flexible substrate having the mixed fluid to protect the mixed fluid.
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公开(公告)号：US11079670B2
公开(公告)日：2021-08-03
申请号：US16334870
申请日：2018-09-21
发明人： Mingxuan Liu , Huibin Guo , Yongzhi Song , Xiaoxiang Zhang , Wenqing Xu , Zumou Wu , Xiaolong Li
IPC分类号： G03F1/26
摘要： Disclosed are a manufacturing method of a phase shift mask and a phase shift mask. The manufacturing method of a phase shift mask includes: forming a pattern of metal shielding layer on a base substrate; forming a phase shift layer and a first photoresist layer in sequence on the pattern of metal shielding layer; patterning the first photoresist layer with the pattern of metal shielding layer serving as a mask to form a pattern of first photoresist layer; and etching the phase shift layer with the pattern of first photoresist layer serving as a mask to form a pattern of phase shift layer.
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6.发明申请公开(公告)号：US20200381523A1
公开(公告)日：2020-12-03
申请号：US16497658
申请日：2019-04-12
发明人： Xiaolong Li , Jinchao Bai , Huibin Guo , Xiao Han , Yongzhi Song
IPC分类号： H01L29/417 , H01L29/66 , H01L29/786 , H01L29/40
摘要： Embodiments of the present disclosure disclose a thin film transistor, a method for manufacturing a thin film transistor, an array substrate, and a display device. The thin film transistor includes a source electrode and a drain electrode, each of the source electrode and the drain electrode including a metal substrate and a conductive layer covering the metal substrate. An adhesion between the conductive layer and a photoresist material is larger than an adhesion between the metal substrate and the photoresist material. The metal substrate and the conductive layer are both formed on a base substrate, an orthographic projection of the conductive layer on the base substrate covers an orthographic projection of the metal substrate on the base substrate, and. an area of the orthographic projection of the conductive layer on the base substrate is larger than an area of the orthographic projection of the metal substrate on the base substrate.
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公开(公告)号：US10551696B2
公开(公告)日：2020-02-04
申请号：US15970803
申请日：2018-05-03
发明人： Xiaolong Li , Xiaoxiang Zhang , Huibin Guo , Mingxuan Liu , Wenqing Xu , Zumou Wu , Yongzhi Song
IPC分类号： H01L21/027 , G02F1/1343 , H01L27/12 , H01L29/45 , H01L29/49 , H01L29/786 , G02F1/1335 , H01L21/3213
摘要： The present disclosure relates to a metal electrode, an array substrate and a method of producing the same, and a display device. In an embodiment, the method includes: forming a protection layer on a metal layer; patterning the protection layer to form a protection pattern, a profile of the protection pattern being the same as a profile of a predetermined pattern of the metal electrode; and etching a part of the metal layer not covered by the protection pattern to form the metal electrode, the metal electrode being covered by the protection pattern, wherein an etching anisotropy of the protection layer is larger than an etching anisotropy of the metal layer.
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8.发明申请公开(公告)号：US20190094597A1
公开(公告)日：2019-03-28
申请号：US15970803
申请日：2018-05-03
发明人： Xiaolong Li , Xiaoxiang Zhang , Huibin Guo , Mingxuan Liu , Wenqing Xu , Zumou Wu , Yongzhi Song
IPC分类号： G02F1/1343 , H01L21/027 , H01L27/12 , H01L29/45 , H01L29/49 , H01L29/786
摘要： The present disclosure relates to a metal electrode, an array substrate and a method of producing the same, and a display device. In an embodiment, the method includes: forming a protection layer on a metal layer; patterning the protection layer to form a protection pattern, a profile of the protection pattern being the same as a profile of a predetermined pattern of the metal electrode; and etching a part of the metal layer not covered by the protection pattern to form the metal electrode, the metal electrode being covered by the protection pattern, wherein an etching anisotropy of the protection layer is larger than an etching anisotropy of the metal layer.
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公开(公告)号：US10197846B2
公开(公告)日：2019-02-05
申请号：US14892066
申请日：2015-06-18
发明人： Yupeng Wang , Xiaolong Li , Lifeng Lin , Chao Tian , Hongming Zhan
IPC分类号： G02F1/1335 , G02F1/13357 , G06F1/16
摘要： A display device includes a display component (1), which includes a liquid crystal panel and a backlight source (11) with the liquid crystal panel including a liquid crystal cell, a first polarizing sheet (12) located on a side of the liquid crystal cell near the backlight source, and a second polarizing sheet (16) located on a side of the liquid crystal cell away from the backlight source. One of the first polarizing sheet (12) and the second polarizing sheet (16) is movable.
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公开(公告)号：US11385537B2
公开(公告)日：2022-07-12
申请号：US16343756
申请日：2018-10-26
发明人： Xiaoxiang Zhang , Mingxuan Liu , Huibin Guo , Yongzhi Song , Xiaolong Li , Wenqing Xu , Zumou Wu
IPC分类号： G03F1/32 , G03F1/30 , G03F1/36 , G03F1/26 , H01L21/027
摘要： A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.
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