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    DIFFUSER STRUCTURE AND MANUFACTURING METHOD THEREOF
    1.
    发明申请
    DIFFUSER STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    扩散器结构及其制造方法

    公开(公告)号：US20110111128A1

    公开(公告)日：2011-05-12

    申请号：US12762335

    申请日：2010-04-18

    申请人： BYUNG-JUN PARK ,  Jin-jong Su ,  Fang-yu Liu

    发明人： BYUNG-JUN PARK ,  Jin-jong Su ,  Fang-yu Liu

    IPC分类号： B05D3/10 ,  C23C16/54

    CPC分类号： C23C16/4404 ,  C23C16/45565 ,  Y10T29/49826

    摘要： A diffuser structure and a manufacturing method thereof are disclosed. The diffuser structure includes a substrate, a plurality of throughholes, and a glue layer. The throughholes are perpendicularly formed in the substrate. Each throughhole includes a gas-in part, a gas-out part, and a connecting part for connecting the gas-in part to the gas-out part. The glue layer is formed on a side wall of each gas-out part, and a thickness of the glue layer is between 1 μm and 11 μm. The present invention can solve a problem that particles are periodically generated after a periodic self-cleaning function is implemented in a plasma-enhanced chemical vapor deposition system.

    摘要翻译： 公开了一种扩散器结构及其制造方法。 扩散器结构包括基底，多个通孔和胶层。 通孔垂直地形成在基板中。 每个通孔包括气体部分，气体输出部分和用于将气体部分连接到气体输出部分的连接部分。 胶层在每个气出部分的侧壁上形成，胶层的厚度在1μm至11μm之间。 本发明可以解决在等离子体增强化学气相沉积系统中实现周期性自清洁功能之后周期性地产生颗粒的问题。

    DIFFUSER STRUCTURE AND MANUFACTURING METHOD THEREOF
    2.
    发明申请
    DIFFUSER STRUCTURE AND MANUFACTURING METHOD THEREOF 审中-公开
    扩散器结构及其制造方法

    公开(公告)号：US20130008005A1

    公开(公告)日：2013-01-10

    申请号：US13609251

    申请日：2012-09-11

    申请人： Byung-jun Park ,  Jin-jong Su ,  Fang-yu Liu

    发明人： Byung-jun Park ,  Jin-jong Su ,  Fang-yu Liu

    IPC分类号： B23P15/00

    CPC分类号： C23C16/4404 ,  C23C16/45565 ,  Y10T29/49826

    摘要： A diffuser structure and a manufacturing method thereof are disclosed. The diffuser structure includes a substrate, a plurality of throughholes, and a glue layer. The throughholes are perpendicularly formed in the substrate. Each throughhole includes a gas-in part, a gas-out part, and a connecting part for connecting the gas-in part to the gas-out part. The glue layer is formed on a side wall of each gas-out part, and a thickness of the glue layer is between 1 μm and 11 μm. The present invention can solve a problem that particles are periodically generated after a periodic self-cleaning function is implemented in a plasma-enhanced chemical vapor deposition system.

    摘要翻译： 公开了一种扩散器结构及其制造方法。 扩散器结构包括基底，多个通孔和胶层。 通孔垂直地形成在基板中。 每个通孔包括气体部分，气体输出部分和用于将气体部分连接到气体输出部分的连接部分。 胶层在每个气出部分的侧壁上形成，胶层的厚度在1μm至11μm之间。 本发明可以解决在等离子体增强化学气相沉积系统中实现周期性自清洁功能之后周期性地产生颗粒的问题。

    Diffuser structure and manufacturing method thereof
    3.
    发明授权
    Diffuser structure and manufacturing method thereof 有权
    扩散器结构及其制造方法

    公开(公告)号：US08944341B2

    公开(公告)日：2015-02-03

    申请号：US12762335

    申请日：2010-04-18

    申请人： Byung-jun Park ,  Jin-jong Su ,  Fang-yu Liu

    发明人： Byung-jun Park ,  Jin-jong Su ,  Fang-yu Liu

    IPC分类号： B05B1/00 ,  C23C16/44 ,  C23C16/455

    CPC分类号： C23C16/4404 ,  C23C16/45565 ,  Y10T29/49826

    摘要： A diffuser structure and a manufacturing method thereof are disclosed. The diffuser structure includes a substrate, a plurality of throughholes, and a glue layer. The throughholes are perpendicularly formed in the substrate. Each throughhole includes a gas-in part, a gas-out part, and a connecting part for connecting the gas-in part to the gas-out part. The glue layer is formed on a side wall of each gas-out part, and a thickness of the glue layer is between 1 μm and 11 μm. The present invention can solve a problem that particles are periodically generated after a periodic self-cleaning function is implemented in a plasma-enhanced chemical vapor deposition system.

    摘要翻译： 公开了一种扩散器结构及其制造方法。 扩散器结构包括基底，多个通孔和胶层。 通孔垂直地形成在基板中。 每个通孔包括气体部分，气体输出部分和用于将气体部分连接到气体输出部分的连接部分。 胶层在每个气出部分的侧壁上形成，胶层的厚度在1μm至11μm之间。 本发明可以解决在等离子体增强化学气相沉积系统中实现周期性自清洁功能之后周期性地产生颗粒的问题。