Temperature-controllable device
    1.
    发明申请
    Temperature-controllable device 失效
    温度可控设备

    公开(公告)号:US20050187502A1

    公开(公告)日:2005-08-25

    申请号:US11064546

    申请日:2005-02-23

    摘要: Described herein are temperature-controllable devices, and methods for using them. In some variations, the devices comprise a fluid passageway region, which is configured to allow a fluid to flow therethrough, and a splint. The splint may be moldable to at least a portion of a subject's anatomy, e.g., a nose. In other variations, the devices comprise a fluid passageway region configured to allow a fluid to flow therethrough, and an absorbent pad. In some variations, the devices comprise three layers, in which two of the layers form a fluid passageway region and the third layer forms a pocket or pouch. In this way, the pouch may be configured to receive at least one splint therein, e.g., in order to provide support to an injured area such as a nose. Methods for using the devices to treat an injured area are also described. Kits are also described.

    摘要翻译: 这里描述的是温度可控的装置,以及使用它们的方法。 在一些变型中,装置包括流体通道区域,其被配置为允许流体流过其中,以及夹板。 夹板可以成型为受试者的解剖结构(例如鼻子)的至少一部分。 在其他变型中,装置包括被配置为允许流体流过其中的流体通道区域和吸收垫。 在一些变型中,装置包括三层,其中两层形成流体通道区域,第三层形成袋或袋。 以这种方式,袋可被配置为在其中容纳至少一个夹板,例如为了向受伤区域(例如鼻子)提供支撑。 还描述了使用该装置来治疗受伤区域的方法。 还描述了套件。

    Transport apparatus for semiconductor wafers
    3.
    发明授权
    Transport apparatus for semiconductor wafers 失效
    半导体晶圆传输装置

    公开(公告)号:US5803979A

    公开(公告)日:1998-09-08

    申请号:US680366

    申请日:1996-07-15

    摘要: Transport apparatus for semiconductor wafers which have been subject to chemical mechanical polishing (CMP). The risk of malfunction of an articulated arm fitted with a vacuum chuck can be reduced in a number of different ways. The end effector can be constructed so that it can be easily removed from the arm for cleaning and can be easily replaced in the desired position without the need for adjustment. The arm can include one or more catch chambers into which materials drawn into the vacuum chuck will be deposited, but which will not interrupt the vacuum. The near end of the vacuum passage can be coupled to a source of a cleaning fluid, so that the cleaning fluid can be passed outwards through the vacuum passage to flush out materials drawn into the vacuum passage through the chuck.

    摘要翻译: 已进行化学机械抛光(CMP)的半导体晶片的传送装置。 装有真空吸盘的铰接臂的故障风险可以以多种不同的方式减少。 端部执行器可以被构造成使得其可以容易地从臂移除以进行清洁,并且可以容易地在期望的位置更换,而不需要调节。 臂可以包括一个或多个捕获室,吸入真空卡盘的材料将沉积到其中,但不会中断真空。 真空通道的近端可以联接到清洁流体源,使得清洁流体可以通过真空通道向外通过,以冲洗通过卡盘抽吸到真空通道中的材料。