公开(公告)号：US12176230B2

公开(公告)日：2024-12-24

申请号：US17512526

申请日：2021-10-27

Applicant: Bum Je Woo

Inventor： Bum Je Woo ,  Sang Hyun Kim ,  Myoung Sok Han ,  Young Chul Kim

IPC: H01L21/673 ,  H01L21/677

Abstract: The present invention relates to an apparatus for removing fume which includes, a wafer cassette for stacking wafers; and an exhaust for exhausting the fume of the wafers stacked in the wafer cassette, wherein the wafer cassette includes stacking shelves provided at both sides for stacking wafers; and a front opening for incoming and outgoing of the wafers which are being stacked in the stacking shelf, wherein the stacking shelves include multiple inclined ramp portions which are slanted towards the wafers stacked in the stacking shelves as they travel towards the front opening, wherein a purge gas outlet is provided in the inclined ramp portion for supplying purge gas for the wafers stacked in the stacking shelves. According to the present invention, the residual process gases on wafers can be removed efficiently.

公开(公告)号：US11715659B2

公开(公告)日：2023-08-01

申请号：US17836703

申请日：2022-06-09

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673 ,  H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67393 ,  H01L21/6773 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67376 ,  H01L21/67386

Abstract: Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.

公开(公告)号：US11443967B2

公开(公告)日：2022-09-13

申请号：US17189026

申请日：2021-03-01

Applicant: Bum Je Woo

Inventor： Bum Je Woo

IPC: B65D85/48 ,  H01L21/673 ,  B08B9/032 ,  B65D85/00 ,  H01L21/677

Abstract: The present invention relates to a wafer storage container capable of removing fumes on a wafer or removing moisture therefrom by supplying purge gas to the wafer stored in a storage chamber. More particularly, the present invention relates to a wafer storage container, in which uniform purge gas injection is achieved and thus formation of dead regions is minimized, formation of turbulence in a storage chamber is prevented and thus wafer purging efficiency is improved, and a size reduction of an injection member injecting purge gas into the storage chamber is achieved and thus a size reduction of the entire wafer storage container is achieved.

公开(公告)号：US10358736B2

公开(公告)日：2019-07-23

申请号：US14725245

申请日：2015-05-29

Applicant: Bum Je Woo

Inventor： Bum Je Woo

IPC: C25D11/04 ,  H01L21/673

Abstract: Provided are a purge gas spraying plate and a method of manufacturing the same, and more particularly, a purge gas spraying plate which sprays a purge gas and a method of manufacturing the same. The purge gas spraying plate is formed by coupling a first plate and a second plate, and a flow path is formed in at least any one of the first plate and the second plate. Thus, compactness of a fume removing apparatus having the purge gas spraying plate is achieved.

公开(公告)号：US12106989B2

公开(公告)日：2024-10-01

申请号：US18332314

申请日：2023-06-09

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67393 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67376 ,  H01L21/67386 ,  H01L21/6773

Abstract: Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.

公开(公告)号：US11355371B2

公开(公告)日：2022-06-07

申请号：US15775359

申请日：2018-04-02

Applicant: Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673

Abstract: The present invention relates to a wafer storage container capable of removing fumes on a wafer or removing moisture therefrom by supplying purge gas to the wafer stored in a storage chamber. More particularly, the present invention relates to a wafer storage container capable of quickly blocking an injection hole and an exhaust hole and of preventing contaminants from flowing into a storage chamber upon the blocking of the exhaust hole.

公开(公告)号：US11152239B2

公开(公告)日：2021-10-19

申请号：US15986501

申请日：2018-05-22

Applicant: Bum Je Woo

Inventor： Bum Je Woo ,  Sang Hyun Kim ,  Myoung Sok Han ,  Young Chul Kim

IPC: H01L21/677 ,  H01L21/673

Abstract: The present invention relates to an apparatus for removing fume which includes, a wafer cassette for stacking wafers; and an exhaust for exhausting the fume of the wafers stacked in the wafer cassette, wherein the wafer cassette includes stacking shelves provided at both sides for stacking wafers; and a front opening for incoming and outgoing of the wafers which are being stacked in the stacking shelf, wherein the stacking shelves include multiple inclined ramp portions which are slanted towards the wafers stacked in the stacking shelves as they travel towards the front opening, wherein a purge gas outlet is provided in the inclined ramp portion for supplying purge gas for the wafers stacked in the stacking shelves. According to the present invention, the residual process gases on wafers can be removed efficiently.

公开(公告)号：US20170011942A1

公开(公告)日：2017-01-12

申请号：US15113221

申请日：2015-01-16

Applicant: Bum Je WOO

Inventor： Bum Je Woo ,  Sang Hyun Kim ,  Myoung Sok Han ,  Young Chul Kim

IPC: H01L21/673

CPC classification number: H01L21/67389 ,  H01L21/6732 ,  H01L21/67383 ,  H01L21/67393 ,  H01L21/67724

Abstract: The present invention relates to an apparatus for removing fume which includes, a wafer cassette for stacking wafers; and an exhaust for exhausting the fume of the wafers stacked in the wafer cassette, wherein the wafer cassette includes stacking shelves provided at both sides for stacking wafers; and a front opening for incoming and outgoing of the wafers which are being stacked in the stacking shelf, wherein the stacking shelves include multiple inclined ramp portions which are slanted towards the wafers stacked in the stacking shelves as they travel towards the front opening, wherein a purge gas outlet is provided in the inclined ramp portion for supplying purge gas for the wafers stacked in the stacking shelves. According to the present invention, the residual process gases on wafers can be removed efficiently.

Abstract translation: 烟雾除去装置技术领域本发明涉及一种除尘装置，其特征在于，包括：用于堆放晶片的晶片盒; 以及用于排出堆叠在所述晶片盒中的所述晶片的烟雾的排气，其中所述晶片盒包括设置在两侧的用于堆叠晶片的堆叠搁板; 以及用于进入和离开堆叠在堆叠架中的晶片的前开口，其中堆叠搁板包括多个倾斜斜面部分，当倾斜朝向前开口行进时，该倾斜斜坡部分朝着堆叠在堆叠搁架中的晶片倾斜，其中 吹扫气体出口设置在倾斜斜坡部分中，用于为堆叠在堆叠货架中的晶片供应净化气体。 根据本发明，可以有效地去除晶片上的残余处理气体。

公开(公告)号：US20160284580A1

公开(公告)日：2016-09-29

申请号：US15079632

申请日：2016-03-24

Applicant: Bum Je Woo ,  Pico & Tera Co., Ltd.

Inventor： Bum Je Woo ,  Seok Mun Yoon ,  Myoung Sok Han ,  Hyun Sin Kim

IPC: H01L21/673

Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.

Abstract translation: 本发明涉及一种晶片储存容器，更具体地说，涉及晶片储存容器，其中晶片储存容器的空间被分为空间，即储藏室，注气室和排气室，其中 彼此独立且分开，因此当晶片储存容器被输送到负载端口并与之耦合时，净化气体通过储藏室内的隔离壁注入/排出，从而有效地除去表面上剩余的烟雾 的晶片。

公开(公告)号：US10937677B2

公开(公告)日：2021-03-02

申请号：US15775771

申请日：2018-04-02

Applicant: Bum Je Woo

Inventor： Bum Je Woo

IPC: B65D85/30 ,  H01L21/673 ,  B08B9/032 ,  B65D85/00 ,  H01L21/677

Abstract: The present invention relates to a wafer storage container capable of removing fumes on a wafer or removing moisture therefrom by supplying purge gas to the wafer stored in a storage chamber. More particularly, the present invention relates to a wafer storage container, in which uniform purge gas injection is achieved and thus formation of dead regions is minimized, formation of turbulence in a storage chamber is prevented and thus wafer purging efficiency is improved, and a size reduction of an injection member injecting purge gas into the storage chamber is achieved and thus a size reduction of the entire wafer storage container is achieved.