Abstract:
Provided is a photo-curable transparent resin in which an oxetane monomer for promotion of photo-curing, control of viscosity, and improvement of physical properties is mixed with a photo-cationically polymerizable cyclo-aliphatic epoxy group-containing oligosiloxane resin prepared by a sol-gel reaction. The photo-cationically polymerizable photo-curable transparent resin added with the oxetane monomer provides a cured product having high curing density and retaining excellent mechanical properties, thermal-mechanical properties, and electrical properties.
Abstract:
Provided are an aqueous solution composition for fluorine doped metal oxide semiconductor, a method for manufacturing a fluorine doped metal oxide semiconductor using the same, and a thin film transistor including the same. The aqueous solution composition for fluorine doped metal oxide semiconductor includes: a fluorine compound precursor made of one or two or more selected from the group consisting of a metal compound containing fluorine and an organic material containing fluorine; and an aqueous solution containing water or catalyst. The method for manufacturing a fluorine doped metal oxide semiconductor, includes: preparing an aqueous solution composition for fluorine doped metal oxide semiconductor, coating a substrate with the aqueous solution composition; and performing heat treatment on the coated substrate to form the fluorine doped metal oxide semiconductor. The thin film transistor of the present invention can exhibit excellent electrical properties even at a temperature for low-temperature annealing, as compared with the metal oxide semiconductor thin film transistor of the related art.
Abstract:
Provided is a non-hydrolytic transparent composite composition having excellent transparency and heat resistance, and a low thermal expansion coefficient. Particularly, the transparent composite composition includes a glass filler dispersed in a crosslinked transparent resin produced by a non-hydrolytic reaction. The non-hydrolytic transparent siloxane resin is a resin having Si—O (siloxane) bonds, a resin having at least one kind of heterometal bonds, including Si—O bonds, or the resin further containing other ingredients. When the transparent siloxane resin produced by a non-hydrolytic reaction forms a composite in combination with the glass filler, the composite realizes high transparency and heat resistance, as well as a low thermal expansion coefficient. Therefore, the transparent composite composition is useful as a substrate for thin film transistor (TFT) devices, display devices and optical devices.