公开(公告)号：US20040206919A1

公开(公告)日：2004-10-21

申请号：US10822720

申请日：2004-04-13

Applicant: Canon Kabushiki Kaisha

Inventor： Masahiko Okunuki ,  Hiroya Ohta

IPC: H01J037/304 ,  H01J037/065

CPC classification number: H01J37/065

Abstract: An electron gun includes a cathode portion (1) which emits electrons, an anode portion (3) which accelerates the emission electrons, a bias portion (2) which is arranged between the cathode portion and anode portion and controls trajectories of the emission electrons, a shielding portion (12) which is arranged below the anode portion and shields some of the emission electrons, and a cooling portion (14) which cools the shielding portion.

Abstract translation: 电子枪包括发射电子的阴极部分（1），加速发射电子的阳极部分（3），设置在阴极部分和阳极部分之间并控制发射电子轨迹的偏压部分（2） 布置在所述阳极部下方并屏蔽所述发射电子的一部分的遮蔽部（12）以及冷却所述遮蔽部的冷却部（14）。

公开(公告)号：US20040188636A1

公开(公告)日：2004-09-30

申请号：US10806190

申请日：2004-03-23

Applicant: CANON KABUSHIKI KAISHA ,  HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Masaki Hosoda ,  Masato Muraki ,  Hiroya Ohta ,  Haruo Yoda

IPC: H01J037/302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/3177 ,  H01J2237/30455

Abstract: An electron beam exposure apparatus which exposes a wafer (118) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays (105, 106) capable of independently deflecting the positions of the electron beams, and pattern data to be projected onto the wafer (118). More specifically, when each of the electron beams is deflected to a predetermined exposure position on the basis of the pattern data, a static positional error independent of the deflection position is corrected by the multi-deflector arrays (105, 106), and a dynamic positional error depending on the deflection position is corrected on the basis of the pattern data.

Abstract translation: 通过使用多个电子束使晶片（118）曝光的电子束曝光装置通过使用能够独立地偏转电子束的位置的多偏转阵列（105,106）来校正电子束的位置误差，以及 图案数据被投影到晶片（118）上。 更具体地说，当基于图案数据将每个电子束偏转到预定曝光位置时，通过多偏转器阵列（105,106）校正与偏转位置无关的静态位置误差，并且动态 基于图案数据来校正取决于偏转位置的位置误差。

公开(公告)号：US20040262539A1

公开(公告)日：2004-12-30

申请号：US10873250

申请日：2004-06-23

Applicant: CANON KABUSHIKI KAISHA ,  HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yoshikiyo Yui ,  Hiroya Ohta

IPC: G01K001/08

CPC classification number: H01J37/065 ,  H01J2237/3175

Abstract: An electron gun is composed of a hemispherical cathode (1) and a second bias electrode (8) having apertures (9, 7, 11) along an optical axis of an electron beam fired from the electron gun, a first bias electrode (6) and an anode (10), arranged in that order, as well as a controller for variably controlling an electric potential applied to the first and second bias electrodes. The controller, for example, holds the sum of the electric potentials of the first and second bias electrodes relative to the cathode (1) substantially constant. Further, by adding one or more third bias electrode(s) (20) between the first and second bias electrodes (6, 8) as necessary, the intensity of the electron beam discharged from the high-intensity, high-emittance electron gun can be adjusted without affecting the current density angular distribution.

Abstract translation: 电子枪由半球形阴极（1）和具有沿着从电子枪发射的电子束的光轴上的孔（9,7,11）的第二偏置电极（8）组成，第一偏置电极（6） 和阳极（10），以及用于可变地控制施加到第一和第二偏置电极的电位的控制器。 例如，控制器保持第一和第二偏置电极相对于阴极（1）的电位的总和基本上恒定。 此外，通过根据需要在第一和第二偏置电极（6,8）之间添加一个或多个第三偏置电极（20），从高强度高发射电子枪放出的电子束的强度可以 在不影响电流密度角分布的情况下进行调整。

公开(公告)号：US20040056578A1

公开(公告)日：2004-03-25

申请号：US10618008

申请日：2003-07-14

Applicant: CANON KABUSHIKI KAISHA

Inventor： Masahiko Okunuki ,  Hiroya Ohta ,  Norio Saito ,  Masaki Takakuwa ,  Sayaka Tanimoto ,  Takeshi Haraguchi

IPC: H01J001/46

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J3/029 ,  H01J37/07 ,  H01J37/09

Abstract: This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.

Abstract translation: 本发明提供一种多电子枪，其产生具有均匀特性的多个电子束。 多电子枪（2）由多个电子枪（2a-2c）形成。 电子枪（2a）除了电子源（21a），Wehnelt电极（22a）和阳极电极（23）之外还具有在Wehnelt电极（22a）和阳极电极（23）之间的屏蔽电极（24） 。 屏蔽电极减少电子枪之间的场干扰。