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1.发明授权公开(公告)号：US11829083B2
公开(公告)日：2023-11-28
申请号：US17201005
申请日：2021-03-15
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Toshiki Iwai , Hiroyuki Matsuda
CPC classification number: G03F9/7088 , G03F7/0002 , G03F9/7065 , G03F9/7096
Abstract: Provided is a detection apparatus having a high detection accuracy.
A detection apparatus comprises an optical element arranged at a position optically conjugate to a target surface, including a first region for forming illumination light that illuminates the target surface with a first angle distribution and a second region for forming illumination light that illuminates the target surface with a second angle distribution, a measurement mark arranged at the target surface; and a detector for detecting a deviation direction and a deviation amount of the optical element based on reflection light from the measurement mark illuminated by the first region and the second region of the optical element.-
公开(公告)号：US20210263432A1
公开(公告)日：2021-08-26
申请号：US17152362
申请日：2021-01-19
Applicant: CANON KABUSHIKI KAISHA
Inventor： Toshiki Iwai , Takamitsu Komaki , Tomokazu Taki
Abstract: Provided is a position measurement apparatus in which a measurement error in a target is reduced.
A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.-
公开(公告)号：US12023850B2
公开(公告)日：2024-07-02
申请号：US17859366
申请日：2022-07-07
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Takafumi Miyaharu
CPC classification number: B29C59/002 , B29C59/02 , B29C2037/906
Abstract: A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
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公开(公告)号：US11934098B2
公开(公告)日：2024-03-19
申请号：US18062100
申请日：2022-12-06
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Toshiki Iwai
CPC classification number: G03F7/0002 , G03F9/7069 , G03F9/7084 , G03F9/7088
Abstract: The present invention provides a detection apparatus for detecting a position of a detection target including a diffraction grating pattern, comprising: an illuminator configured to illuminate the detection target with illumination light including a plurality of wavelengths; a wavelength selector including an incident surface on which diffracted light from the detection target is incident, and configured to select light of a specific wavelength from the diffracted light; and a detector configured to receive the light of the specific wavelength selected by the wavelength selector and detect the position of the detection target, wherein positions on the incident surface where light components of the plurality of wavelengths included in the illumination light are incident are different from each other, and wherein the wavelength selector controls each of the plurality of elements in accordance with the position on the incident surface.
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Patent Agency Ranking
5.发明申请公开(公告)号：US20210318626A1
公开(公告)日：2021-10-14
申请号：US17201005
申请日：2021-03-15
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Toshiki Iwai , Hiroyuki Matsuda
Abstract: Provided is a detection apparatus having a high detection accuracy.
A detection apparatus comprises an optical element arranged at a position optically conjugate to a target surface, including a first region for forming illumination light that illuminates the target surface with a first angle distribution and a second region for forming illumination light that illuminates the target surface with a second angle distribution, a measurement mark arranged at the target surface; and a detector for detecting a deviation direction and a deviation amount of the optical element based on reflection light from the measurement mark illuminated by the first region and the second region of the optical element.-
公开(公告)号：US20230031701A1
公开(公告)日：2023-02-02
申请号：US17859366
申请日：2022-07-07
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Takafumi Miyaharu
Abstract: A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
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公开(公告)号：US11372342B2
公开(公告)日：2022-06-28
申请号：US17152362
申请日：2021-01-19
Applicant: CANON KABUSHIKI KAISHA
Inventor： Toshiki Iwai , Takamitsu Komaki , Tomokazu Taki
Abstract: Provided is a position measurement apparatus in which a measurement error in a target is reduced.
A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.-
公开(公告)号：US10001702B2
公开(公告)日：2018-06-19
申请号：US14276829
申请日：2014-05-13
Applicant: CANON KABUSHIKI KAISHA
Inventor： Takashi Toshima , Tomokazu Taki
IPC: G03F7/00
CPC classification number: G03F7/0002
Abstract: An imprinting apparatus that imprints a pattern on a resin on a substrate using a mold, includes a detector configured to detect a mold mark and a substrate mark, a driving unit configured to change relative positions of the mold and substrate, a curing unit configured to cure the resin, and a controller configured to control the detector, the driving unit, and the curing unit. The controller performs an alignment step of controlling the driving unit in accordance with the detected mold and substrate marks to perform alignment, a curing step of causing the curing unit to cure the resin in contact with the mold after the alignment step, and a detection step of causing the detector to detect the mold and substrate marks after the curing step to determine an amount of relative misalignment between the mold and the substrate after the resin has been cured.
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公开(公告)号：US20140339721A1
公开(公告)日：2014-11-20
申请号：US14276829
申请日：2014-05-13
Applicant: CANON KABUSHIKI KAISHA
Inventor： Takashi Toshima , Tomokazu Taki
IPC: B29C59/00
CPC classification number: G03F7/0002
Abstract: An imprinting apparatus that imprints a pattern on a resin on a substrate using a mold, includes a detector configured to detect a mold mark and a substrate mark, a driving unit configured to change relative positions of the mold and substrate, a curing unit configured to cure the resin, and a controller configured to control the detector, the driving unit, and the curing unit. The controller performs an alignment step of controlling the driving unit in accordance with the detected mold and substrate marks to perform alignment, a curing step of causing the curing unit to cure the resin in contact with the mold after the alignment step, and a detection step of causing the detector to detect the mold and substrate marks after the curing step to determine an amount of relative misalignment between the mold and the substrate after the resin has been cured.
Abstract translation: 使用模具将图案印刷在基板上的树脂上的压印装置包括检测模具标记和基板标记的检测器，被配置为改变模具和基板的相对位置的驱动单元，被配置为 固化树脂，以及配置成控制检测器，驱动单元和固化单元的控制器。 控制器执行对准步骤，根据检测到的模具和基板标记来控制驱动单元以进行对准;固化步骤，使固化单元在对准步骤之后固化与模具接触的树脂;以及检测步骤 使得检测器在固化步骤之后检测模具和基底标记，以确定在树脂固化之后模具和基底之间的相对不对准量。
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