专利检索 ap:("CANON MEDICAL SYSTEMS CORPORATION") AND inv:"Nobuhiko SATO" 第 1 页

1.

发明公开
SEMICONDUCTOR APPARATUS, SEMICONDUCTOR APPARATUS MANUFACTURING METHOD, AND X-RAY COMPUTED TOMOGRAPHY APPARATUS 审中-公开

公开(公告)号：US20240355668A1

公开(公告)日：2024-10-24

申请号：US18637949

申请日：2024-04-17

申请人： CANON MEDICAL SYSTEMS CORPORATION

发明人： Tatsuya SUZUKI , Nobuhiko SATO

IPC分类号： H01L21/70 , H01L21/02 , H01L21/28 , H01L21/8234

CPC分类号： H01L21/707 , H01L21/0214 , H01L21/0228 , H01L21/28202 , H01L21/823475

摘要： A semiconductor apparatus according to an embodiment of the present disclosure includes: a substrate; a wiring layer serving as a topmost layer formed over the substrate; a first protection film formed so as to cover the wiring layer; a planarization film formed on the first protection film; and a second protection film formed on the planarization film. The first protection film and the second protection film are each thicker than the planarization film.