专利检索 ap:("CHANG CHUN PLASTICS CO., LTD.") AND inv:"Chian Wen Hong" 第 1 页

1.

发明授权
Polyhydric phenol resin, glycidyl ether of polyhydric phenol resin, and uses thereof 有权

公开(公告)号：US11629216B2

公开(公告)日：2023-04-18

申请号：US17577517

申请日：2022-01-18

申请人： CHANG CHUN PLASTICS CO., LTD.

发明人： Chian Wen Hong , Sung-Kuang Chung , An-Pang Tu

IPC分类号： C08G8/12 , B32B15/20 , C08G59/06 , C08G59/40 , B32B5/02 , B32B5/26 , B32B15/14 , B01J20/281 , G01N30/72 , G01N30/74 , G01N30/02

摘要： A polyhydric phenol resin is provided. The polyhydric phenol resin comprises a polyhydric phenol resin component and a first component. When the polyhydric phenol resin is characterized in a high-performance liquid chromatography (HPLC), the first component is eluted at a retention time ranging from 27.1 minutes to 28.0 minutes, and based on the total area of the chromatographic peaks of the polyhydric phenol resin, the area percentage of the chromatographic peak of the first component at the corresponding retention time in the spectrum ranges from 1.0% to 20%.