公开(公告)号：US20250002399A1

公开(公告)日：2025-01-02

申请号：US18735717

申请日：2024-06-06

Applicant: CORNING INCORPORATED

Inventor： Jiangwei Feng ,  Timothy James Orcutt ,  Shai Negev Shafrir ,  Istvan Laszlo Szabo

IPC: C03C15/02 ,  C03C3/155 ,  C03C23/00

Abstract: Methods for making a glass article include etching the surfaces of the glass article with an etchant solution that includes hydrofluoric acid to produce an etched glass article. The glass article being a high index glass containing transition metal oxides and having an index of refraction greater than or equal to about 1.6 at 589.3 nm wavelength. The surface having surface and subsurface defects. The etching improves a surface strength of the surfaces of the etched glass article by removing or rounding the surface and subsurface defects, and the etching causes deposition of transition metal fluorides. The methods include cleaning the surfaces of the etched glass article with a cleaning solution having a pH of greater than or equal to about 10 to remove transition metal fluorides from the surfaces of the etched glass article.

公开(公告)号：US09926225B2

公开(公告)日：2018-03-27

申请号：US14363147

申请日：2012-12-10

Applicant: CORNING INCORPORATED

Inventor： Yunfeng Gu ,  Jun Hou ,  Timothy James Orcutt ,  Daniel Arthur Sternquist ,  Jeffery Scott Stone

IPC: C03C15/02 ,  C09K13/08 ,  C09K13/04

CPC classification number: C03C15/02 ,  C09K13/04 ,  C09K13/08

Abstract: Described herein are aqueous acidic glass etching solutions or media comprising HF and H2SO4, wherein HF is present in concentrations not exceeding about 1.3M. The etching solutions are used to treat glass articles such as thin glass sheets at above-ambient temperatures to etch slight thicknesses of surface glass therefrom, the etching solutions exhibiting improved stability against dissolved glass precipitation and rapid glass removal rates at slightly elevated temperatures.

公开(公告)号：US20140339194A1

公开(公告)日：2014-11-20

申请号：US14363147

申请日：2012-12-10

Applicant: CORNING INCORPORATED

Inventor： Yunfeng Gu ,  Jun Hou ,  Timothy James Orcutt ,  Daniel Arthur Sternquist ,  Jeffery Scott Stone

IPC: C03C15/02 ,  C09K13/08

CPC classification number: C03C15/02 ,  C09K13/04 ,  C09K13/08

Abstract: Described herein are aqueous acidic glass etching solutions or media comprising HF and H2SO4, wherein HF is present in concentrations not exceeding about 1.3M. The etching solutions are used to treat glass articles such as thin glass sheets at above-ambient temperatures to etch slight thicknesses of surface glass therefrom, the etching solutions exhibiting improved stability against dissolved glass precipitation and rapid glass removal rates at slightly elevated temperatures.

Abstract translation: 本文描述的是含水的酸性玻璃蚀刻溶液或包含HF和H 2 SO 4的介质，其中HF的浓度不超过约1.3M。 蚀刻溶液用于在高于环境温度下处理玻璃制品例如薄玻璃板以从其中蚀刻表面玻璃的轻微厚度，所述蚀刻溶液在稍微升高的温度下表现出对溶解的玻璃沉淀的稳定性和快速的玻璃去除速率。