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公开(公告)号:US20150056892A1
公开(公告)日:2015-02-26
申请号:US14459452
申请日:2014-08-14
Applicant: Cabot Microelectronics Corporation
Inventor: Robert VACASSY , George FOTOU
IPC: B24B37/24 , C08J9/00 , H01L21/306 , B24B37/22 , B24B37/04
CPC classification number: B24B37/24 , B24B37/042 , B24B37/22 , C08J9/122 , C08J2201/032 , C08J2203/06 , C08J2205/044 , C08J2205/052 , C08J2207/00 , C08J2300/22 , C08J2300/26 , C08J2375/04
Abstract: Disclosed is a polishing pad for chemical-mechanical polishing. The polishing pad has a porous interface and a substantially non-porous bulk core. Also disclosed are related apparatus and methods for using and preparing the polishing pad.
Abstract translation: 公开了一种用于化学机械抛光的抛光垫。 抛光垫具有多孔界面和基本上无孔的块体。 还公开了用于使用和制备抛光垫的相关装置和方法。