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公开(公告)号：US11061337B2
公开(公告)日：2021-07-13
申请号：US16809097
申请日：2020-03-04
发明人： Koji Mikami , Atsushi Shigenobu
摘要： An exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and exposes the substrate is provided. The apparatus comprises an aberration correction member arranged on an optical path of exposure light between the original and the substrate, and a driver which drives the aberration correction member. The aberration correction member includes a first optical element including a first surface having a three-fold rotational symmetric aspherical shape with respect to an optical axis of the exposure light, and a second optical element spaced apart from the first optical element along the optical axis and including a second surface facing the first surface and having an aspherical shape that complementarily corrects an aberration generated by the first optical element.
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公开(公告)号：US11199784B2
公开(公告)日：2021-12-14
申请号：US16872623
申请日：2020-05-12
摘要： An exposure apparatus that performs a job process of exposing each of a plurality of substrates while exchanging the substrate is provided. The apparatus comprises a substrate holder configured to hold a substrate, and a controller configured to control the job process. The controller corrects, based on a relationship between an elapsed time of the job process and a substrate deformation amount, an overlay error generated due to deformation of the substrate, and exposes the substrate. In the relationship, the substrate conveyed to the substrate holder upon a substrate exchange is given an initial deformation amount corresponding to residual heat of the substrate holder at the time of the substrate exchange.
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3.发明申请METHOD OF CALCULATING AMOUNT OF FLUCTUATION OF IMAGING CHARACTERISTIC OF PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF FABRICATING DEVICE 审中-公开计算投影光学系统成像特性的影响的方法，曝光装置和制作装置的方法公开(公告)号：US20140233007A1
公开(公告)日：2014-08-21
申请号：US14260143
申请日：2014-04-23
发明人： Rika Takahashi , Atsushi Shigenobu
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03B27/52 , G03F7/2022 , G03F7/705 , G03F7/706
摘要： In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band.
摘要翻译： 在基板暴露于第一波长带的曝光光的情况下，对于第一波长带，曝光系数被定义为每单位曝光能量的投影光学系统的成像特性的波动量的量是 使用投影光学系统的光学特性的波动量的数据来计算。 使用第一波长带的曝光系数来计算与第一波长带不同的第二波长带的曝光系数。 在基板暴露于第二波长带的曝光光的情况下，使用第二波长带的曝光系数来计算投影光学系统的成像特性的波动量。
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公开(公告)号：US11947267B2
公开(公告)日：2024-04-02
申请号：US17952380
申请日：2022-09-26
发明人： Atsushi Shigenobu , Fuma Kizu
IPC分类号： G03F7/00
CPC分类号： G03F7/705
摘要： A method including calculating, using an objective function, which includes a regression model used to estimate an array of a plurality of regions on a substrate and a regularization term used to limit a value of a coefficient of the regression model, a value of each of a plurality of coefficients included in the regression model, with which the objective function becomes not more than a reference value, extracting, based on the calculated values, the coefficient having the value not less than a threshold value from the plurality of coefficients, and obtaining, using a regression model including only the extracted coefficient, an array of a plurality of regions on a substrate.
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公开(公告)号：US20220269187A1
公开(公告)日：2022-08-25
申请号：US17587137
申请日：2022-01-28
发明人： Atsushi Shigenobu
IPC分类号： G03F9/00
摘要： The preset invention provides a method of obtaining an array of a plurality of regions on a substrate, including obtaining, using a prior distribution representing a probability distribution of parameters of a regression model used to estimate the array, a first posterior distribution representing the probability distribution of the parameters, obtaining, using the first posterior distribution as the prior distribution representing the probability distribution of the parameters, a second posterior distribution representing the probability distribution of the parameters, and updating the regression model by deciding the parameters based on the second posterior distribution and obtaining, using the updated regression model, the array of the plurality of regions on a substrate from the second position measurement data.
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6.发明授权公开(公告)号：US09116444B2
公开(公告)日：2015-08-25
申请号：US14260143
申请日：2014-04-23
发明人： Rika Takahashi , Atsushi Shigenobu
CPC分类号： G03F7/70575 , G03B27/52 , G03F7/2022 , G03F7/705 , G03F7/706
摘要： In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band.
摘要翻译： 在基板暴露于第一波长带的曝光光的情况下，对于第一波长带，曝光系数被定义为每单位曝光能量的投影光学系统的成像特性的波动量的量是 使用投影光学系统的光学特性的波动量的数据来计算。 使用第一波长带的曝光系数来计算与第一波长带不同的第二波长带的曝光系数。 在基板暴露于第二波长带的曝光光的情况下，使用第二波长带的曝光系数来计算投影光学系统的成像特性的波动量。
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7.发明申请公开(公告)号：US20130137050A1
公开(公告)日：2013-05-30
申请号：US13685915
申请日：2012-11-27
发明人： Rika Takahashi , Atsushi Shigenobu
IPC分类号： G03B27/52
CPC分类号： G03F7/70575 , G03B27/52 , G03F7/2022 , G03F7/705 , G03F7/706
摘要： In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band.
摘要翻译： 在基板暴露于第一波长带的曝光光的情况下，对于第一波长带，曝光系数被定义为每单位曝光能量的投影光学系统的成像特性的波动量的量是 使用投影光学系统的光学特性的波动量的数据来计算。 使用第一波长带的曝光系数来计算与第一波长带不同的第二波长带的曝光系数。 在基板暴露于第二波长带的曝光光的情况下，使用第二波长带的曝光系数来计算投影光学系统的成像特性的波动量。
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公开(公告)号：US12130562B2
公开(公告)日：2024-10-29
申请号：US17587137
申请日：2022-01-28
发明人： Atsushi Shigenobu
CPC分类号： G03F9/7011 , G03F9/7019
摘要： The preset invention provides a method of obtaining an array of a plurality of regions on a substrate, including obtaining, using a prior distribution representing a probability distribution of parameters of a regression model used to estimate the array, a first posterior distribution representing the probability distribution of the parameters, obtaining, using the first posterior distribution as the prior distribution representing the probability distribution of the parameters, a second posterior distribution representing the probability distribution of the parameters, and updating the regression model by deciding the parameters based on the second posterior distribution and obtaining, using the updated regression model, the array of the plurality of regions on a substrate from the second position measurement data.
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公开(公告)号：US20200292945A1
公开(公告)日：2020-09-17
申请号：US16809097
申请日：2020-03-04
发明人： Koji Mikami , Atsushi Shigenobu
IPC分类号： G03F7/20
摘要： An exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and exposes the substrate is provided. The apparatus comprises an aberration correction member arranged on an optical path of exposure light between the original and the substrate, and a driver which drives the aberration correction member. The aberration correction member includes a first optical element including a first surface having a three-fold rotational symmetric aspherical shape with respect to an optical axis of the exposure light, and a second optical element spaced apart from the first optical element along the optical axis and including a second surface facing the first surface and having an aspherical shape that complementarily corrects an aberration generated by the first optical element.
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10.发明授权公开(公告)号：US08741510B2
公开(公告)日：2014-06-03
申请号：US13685915
申请日：2012-11-27
发明人： Rika Takahashi , Atsushi Shigenobu
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03B27/52 , G03F7/2022 , G03F7/705 , G03F7/706
摘要： In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band.
摘要翻译： 在基板暴露于第一波长带的曝光光的情况下，对于第一波长带，曝光系数被定义为每单位曝光能量的投影光学系统的成像特性的波动量的量是 使用投影光学系统的光学特性的波动量的数据来计算。 使用第一波长带的曝光系数来计算与第一波长带不同的第二波长带的曝光系数。 在基板暴露于第二波长带的曝光光的情况下，使用第二波长带的曝光系数来计算投影光学系统的成像特性的波动量。
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