公开(公告)号：US10690812B2

公开(公告)日：2020-06-23

申请号：US14854784

申请日：2015-09-15

申请人： Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

发明人： Hermanus Hendricus Petrus Theodorus Bekman ,  Dirk Heinrich Ehm ,  Jeroen Huijbregtse ,  Arnoldus Jan Storm ,  Tina Graber ,  Irene Ament ,  Dries Smeets ,  Edwin Te Sligte ,  Alexey Kuznetsov

IPC分类号： G02B1/14 ,  G02B5/08 ,  G21K1/06 ,  G03F7/20 ,  C23C16/56

摘要： An optical element (50), comprising: a substrate (52), an EUV radiation reflecting multilayer system (51) applied to the substrate, and a protective layer system (60) applied to the multilayer system and having at least a first and a second layer (57, 58). The first layer (57) is arranged closer to the multilayer system (51) than is the second layer (58) and serves as a diffusion barrier for hydrogen. This first layer (57) has a lower solubility for hydrogen than does the second layer (58), which serves for absorbing hydrogen. Also disclosed are an optical system for EUV lithography with at least one such optical element, and a method for treating an optical element in order to remove hydrogen incorporated in at least one layer (57, 58, 59) of the protective layer system and/or in at least one layer (53, 54) of the multilayer system (51).

公开(公告)号：US11099484B2

公开(公告)日：2021-08-24

申请号：US16433572

申请日：2019-06-06

申请人： Carl Zeiss SMT GmbH

发明人： Robert Meier ,  Holger Kierey ,  Christof Jalics ,  Eric Eva ,  Ralf Winter ,  Arno Schmittner ,  Alexey Kuznetsov ,  Vitaliy Shklover ,  Christoph Nottbohm ,  Wolfgang Merkel

IPC分类号： G03F7/20 ,  G21K1/06

摘要： A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements (60) have a substrate (61) and a coating (62) that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area (63, 64, 65, 66) in the coating (62) and covering the damaged area (63, 64, 65, 66) with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors (70) for EUV lithography. After the repair, the optical elements have cover elements (71, 72, 73).