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公开(公告)号：US11126087B2
公开(公告)日：2021-09-21
申请号：US16355116
申请日：2019-03-15
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
Abstract: A component for a mirror array for EUV lithography, particularly for use in faceted mirrors in illumination systems of EUV lithography devices. A component (500) for a mirror array for EUV lithography is proposed which is at least partially made from a composite material including matrix material (502) that contains copper and/or aluminium, and reinforcing material in the form of fibers (504). The composite material also includes particles (508) that consist of one or more of the materials from the group: graphite, adamantine carbon, and ceramic.
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公开(公告)号：US20240027730A1
公开(公告)日：2024-01-25
申请号：US18474561
申请日：2023-09-26
Applicant: Carl Zeiss SMT GmbH
Inventor： Christoph Zaczek , Erik Loopstra , Eric Eva
CPC classification number: G02B7/1815 , G02B5/0891 , G03F7/70316 , G03F7/70891
Abstract: A method for producing a mirror of a lithography system includes providing first and second mirror parts. Cooling channels having elongate cooling channel openings in the region of a first connecting surface of the first mirror part are formed in the first mirror part, and/or cooling channels having elongate cooling channel openings in the region of a second connecting surface of the second mirror part are formed in the second mirror part. The method also includes bringing together the first and second mirror parts so that initially a partial region of the first connecting surface and a partial region of the second connecting surface come into contact and form a common contact surface. The common contact surface is enlarged by continuing to bring the first and second mirror parts together in a direction along the longitudinal extents of the cooling channel openings.
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公开(公告)号：US10976667B2
公开(公告)日：2021-04-13
申请号：US15395460
申请日：2016-12-30
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
Abstract: An optical manipulator (MAN) includes an optical element (OE), in particular composed of fused silica, and an actuating device (DR) that reversibly changes the surface form (SF) of the optical element (OE). The actuating device (DR) has a plurality of actuators (AK) that mechanically act on the optical element (OE) at a plurality of contact areas. The optical element (OE) at least at action regions in vicinities of the contact areas of the actuators (AK) is prestressed to an compressive stress of more than 1 MPa, preferably of more than 100 MPa, particularly preferably of more than 500 MPa. Also disclosed are a projection lens provided with at least one such optical manipulator (MAN), a projection exposure apparatus having such a projection lens, and a method for producing such an optical manipulator (MAN).
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4.发明授权公开(公告)号：US10427965B2
公开(公告)日：2019-10-01
申请号：US15013499
申请日：2016-02-02
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
Abstract: A method for loading a blank composed of fused silica with hydrogen, including loading the blank at a first temperature (T1) and a first hydrogen partial pressure (p1), and further loading the blank at a second temperature (T2) which is different from the first temperature and at a second hydrogen partial pressure (p2) which is different from the first hydrogen partial pressure. The first and second temperatures (T1, T2) are lower than a limit temperature (TL) at which a thermal formation of silane in the fused silica of the blank commences. Also disclosed are a lens element produced from such a blank and a projection lens that includes at least one such lens element.
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公开(公告)号：US11874525B2
公开(公告)日：2024-01-16
申请号：US17805175
申请日：2022-06-02
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
IPC: G03F7/00 , G02B7/18 , B23K26/0622 , B23K26/55 , C03C14/00 , G02B5/08 , G02B17/06 , B23K103/00
CPC classification number: G02B7/1815 , B23K26/0624 , B23K26/55 , C03C14/004 , G02B5/085 , G02B5/0891 , G02B17/0663 , G03F7/70316 , G03F7/70891 , G03F7/70958 , B23K2103/54 , C03C2214/04 , C03C2214/20
Abstract: An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/−20% over the length of the channel.
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Patent Agency Ranking
公开(公告)号：US12117731B2
公开(公告)日：2024-10-15
申请号：US18080109
申请日：2022-12-13
Applicant: Carl Zeiss SMT GmbH
Inventor： Christoph Zaczek , Erik Loopstra , Eric Eva , Drew Chieda , Matthew Lipson , Victor Perez-Falcon , Moshe Shemesh
IPC: G03F7/00
CPC classification number: G03F7/702 , G03F7/70891 , G03F7/7095 , G03F7/70975
Abstract: This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.
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公开(公告)号：US11987521B2
公开(公告)日：2024-05-21
申请号：US17136642
申请日：2020-12-29
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
CPC classification number: C03C3/06 , G02B5/0891 , G02B7/181 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/23 , C03C2201/42
Abstract: In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*1016/cm3 and/or a proportion of Si—Si bonds of at least 1*1016/cm3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5×1018 molecules/cm3.
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公开(公告)号：US20240019613A1
公开(公告)日：2024-01-18
申请号：US18475450
申请日：2023-09-27
Applicant: Carl Zeiss SMT GmbH
Inventor： Christoph Zaczek , Erik Loopstra , Eric Eva
CPC classification number: G02B5/0891 , G03F7/70316 , G03F7/70891
Abstract: A method for producing a mirror of a microlithographic projection exposure apparatus comprises providing a first mirror part having a first connecting surface and a second mirror part having a second connecting surface is provided. Cooling channels and/or auxiliary channels are formed in the second mirror part. The method also includes bringing together the first and second mirror parts so that initially a partial region of the first connecting surface and a partial region of the second connecting surface come into contact and form a common contact surface. The method further includes enlarging the contact surface by continuing to bring the first and second mirror parts together in a transverse direction with respect to the cooling channels or auxiliary channels.
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公开(公告)号：US20220299731A1
公开(公告)日：2022-09-22
申请号：US17805175
申请日：2022-06-02
Applicant: Carl Zeiss SMT GmbH
Inventor： Eric Eva
Abstract: An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/−20% over the length of the channel.
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10.发明公开公开(公告)号：US20230375939A1
公开(公告)日：2023-11-23
申请号：US18362630
申请日：2023-07-31
Applicant: Carl Zeiss SMT Gmbh
Inventor： Christoph Zaczek , Erik Loopstra , Eric Eva
CPC classification number: G03F7/70166 , G02B5/0891
Abstract: A method for producing a mirror of a projection exposure apparatus for microlithography includes providing at least one material blank. The material blank comprises a material with a very low coefficient of thermal expansion and has fault zones within which at least one material parameter deviates from a specified value by more than a minimum deviation. A first mirror part having a first connecting surface is produced from the material blank. A second mirror part having a second connecting surface is produced from the material blank or a further material blank. The first and second mirror parts are permanently connected to one another in the region of the first and second connecting surfaces.
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