LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME

    公开(公告)号:US20190072861A1

    公开(公告)日:2019-03-07

    申请号:US15966591

    申请日:2018-04-30

    IPC分类号: G03F7/20

    摘要: A system includes a microlithography projection objective configured to image radiation from an object plane to an image plane along a radiation path. The microlithography projection objective has an optical axis. The microlithography projection objective includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes an optical element. During use of the system, a liquid is present. The system is configured so that, during use of the system, a distance between the optical element and the image plane is varied to reduce at least one aberration induced by a change in a temperature in the system.

    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
    2.
    发明申请
    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 有权
    图像投影目标和校正其图像缺陷的方法

    公开(公告)号:US20160370709A1

    公开(公告)日:2016-12-22

    申请号:US15099172

    申请日:2016-04-14

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70341 G03F7/7015

    摘要: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

    摘要翻译: 一种用于将物平面中的图案成像到图像平面中的基板上的光刻投影物镜。 投影物镜包括沿着光轴的多个光学元件。 光学元件包括跟随物平面的第一组光学元件和最后一个光学元件,跟随第一组并且靠近图像平面。 投影物镜相对于像差是可调谐的或调谐的,在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置,其在浸入操作期间至少定位最后一个光学元件,使得由干扰引起的像差至少部分地被补偿。

    Catadioptric Projection Objective With Intermediate Images
    3.
    发明申请
    Catadioptric Projection Objective With Intermediate Images 有权
    反射折射投影目标与中间图像

    公开(公告)号:US20150205084A1

    公开(公告)日:2015-07-23

    申请号:US14672497

    申请日:2015-03-30

    IPC分类号: G02B17/08

    摘要: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

    摘要翻译: 反射折射投射物镜具有第一物镜部分,限定光轴的第一部分并对物场进行成像以形成第一实际中间像。 它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。 第二目标部分具有凹面镜并且限定光轴的第二部分。 第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。 折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。 由第一目标部分限定的光轴的第一部分与光轴的第三部分横向偏移并与其平行。

    CATADIOPTRIC PROJECTION OBJECTIVE
    4.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号:US20140111787A1

    公开(公告)日:2014-04-24

    申请号:US14143060

    申请日:2013-12-30

    IPC分类号: G02B17/08

    摘要: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

    摘要翻译: 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分,包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分,用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax,最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /(Y'·NA2),并且其中条件COMP1 <10成立。

    Catadioptric Projection Objective With Intermediate Images

    公开(公告)号:US20140111786A1

    公开(公告)日:2014-04-24

    申请号:US14143004

    申请日:2013-12-30

    IPC分类号: G02B17/08

    摘要: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

    Catadioptric Projection Objective With Intermediate Images

    公开(公告)号:US20140078483A1

    公开(公告)日:2014-03-20

    申请号:US14079026

    申请日:2013-11-13

    IPC分类号: G03F7/20 G02B17/08

    摘要: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

    Catadioptric projection objective with intermediate images

    公开(公告)号:US09726979B2

    公开(公告)日:2017-08-08

    申请号:US14672497

    申请日:2015-03-30

    摘要: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

    CATADIOPTRIC PROJECTION OBJECTIVE
    8.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
    目标投影目标

    公开(公告)号:US20150055214A1

    公开(公告)日:2015-02-26

    申请号:US14529592

    申请日:2014-10-31

    IPC分类号: G02B17/08 G03F7/20

    摘要: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

    摘要翻译: 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分,包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分,用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax,最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /(Y'·NA2),并且其中条件COMP1 <10成立。

    MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, TOOL AND METHOD OF PRODUCTION
    9.
    发明申请
    MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, TOOL AND METHOD OF PRODUCTION 有权
    微电子投影光学系统,工具和生产方法

    公开(公告)号:US20150049319A1

    公开(公告)日:2015-02-19

    申请号:US14496367

    申请日:2014-09-25

    IPC分类号: G03F7/20 G02B17/08

    摘要: A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of face shifting masks as objects to be imaged, in particular for EUV wavelengths.

    摘要翻译: 公开了一种微光刻投影光学系统。 该系统可以包括多个光学元件,其被布置成将来自物体平面中的物体场的具有波长λ的辐射成像到图像平面中的图像场。 多个光学元件可以具有距离物面大于2.8μm的入射光瞳。 通过光学系统的辐射路径的特征在于主要光线相对于物平面的法线具有3°或更大的角度。 这可以允许使用面部移动掩模作为要成像的对象,特别是对于EUV波长。