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    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
    1.
    发明申请
    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开

    公开(公告)号：US20180164474A1

    公开(公告)日：2018-06-14

    申请号：US15894293

    申请日：2018-02-12

    申请人： Carl Zeiss SMT GmbH

    发明人： Daniel Kraehmer ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  Toralf Gruner

    IPC分类号： G02B5/00 ,  G03F7/20 ,  G02B27/00 ,  G02B17/06

    CPC分类号： G02B5/003 ,  G02B5/005 ,  G02B17/0657 ,  G02B27/0018 ,  G03F7/70233

    摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

    Optical system for a microlithographic projection exposure apparatus
    3.
    发明授权
    Optical system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的光学系统

    公开(公告)号：US08922753B2

    公开(公告)日：2014-12-30

    申请号：US14179722

    申请日：2014-02-13

    申请人： Carl Zeiss SMT GmbH

    发明人： Daniel Kraehmer ,  Ingo Saenger

    IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20 ,  G02B27/28

    CPC分类号： G03F7/70566 ,  G02B27/286

    摘要： The invention relates to an optical system for a microlithographic projection exposure apparatus, including an optical system axis (OA) and a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement includes a first polarization-influencing element, which is produced from optically uniaxial crystal material and has a first orientation of the optical crystal axis, the-first orientation being perpendicular to the optical system axis and a thickness that varies in the direction of the optical system axis, and a second polarization-influencing element, which is arranged downstream of the first polarization-influencing element in the light propagation direction, is produced from optically uniaxial crystal material and has a second orientation of the optical crystal axis, the second orientation being perpendicular to the optical system axis, and a plane-parallel geometry, wherein the second orientation is different from the first orientation.

    摘要翻译： 本发明涉及一种用于微光刻投影曝光装置的光学系统，包括光学系统轴（OA）和偏振影响光学装置，其中偏振影响光学装置包括第一偏振影响元件，其由光学 单轴晶体材料，并且具有光学晶体轴的第一取向，第一取向垂直于光学系统轴线，并且具有在光学系统轴线方向上变化的厚度，以及第二偏振影响元件，其被布置在下游 在光传播方向上的第一偏振影响元件由光学单轴晶体材料制成，并且具有光学晶轴的第二取向，第二取向垂直于光学系统轴线和平面平行几何形状，其中 第二取向与第一取向不同。

    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
    7.
    发明申请
    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 有权
    图像投影目标和校正其图像缺陷的方法

    公开(公告)号：US20140327891A1

    公开(公告)日：2014-11-06

    申请号：US14315577

    申请日：2014-06-26

    申请人： Carl Zeiss SMT GmbH

    发明人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/7015

    摘要： A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

    摘要翻译： 一种用于将物平面中的图案成像到图像平面中的基板上的光刻投影物镜。 投影物镜包括沿着光轴的多个光学元件。 光学元件包括跟随物平面的第一组光学元件和最后一个光学元件，跟随第一组并且靠近图像平面。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。

    Lithography projection objective, and a method for correcting image defects of the same
    10.
    发明授权
    Lithography projection objective, and a method for correcting image defects of the same 有权
    平版印刷投影物镜，以及用于校正图像缺陷的方法

    公开(公告)号：US09316922B2

    公开(公告)日：2016-04-19

    申请号：US14315577

    申请日：2014-06-26

    申请人： Carl Zeiss SMT GmbH

    发明人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    IPC分类号： G02B3/00 ,  G03B27/42 ,  G03C1/00 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/7015

    摘要： A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

    摘要翻译： 一种用于将物平面中的图案成像到图像平面中的基板上的光刻投影物镜。 投影物镜包括沿着光轴的多个光学元件。 光学元件包括跟随物平面的第一组光学元件和最后一个光学元件，跟随第一组并且靠近图像平面。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。