公开(公告)号：US07914594B2

公开(公告)日：2011-03-29

申请号：US12180289

申请日：2008-07-25

申请人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

发明人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

IPC分类号： B01D46/00

CPC分类号： B01D46/0058 ,  B01D46/002 ,  B01D46/24 ,  B01D46/4272 ,  Y10S55/31

摘要： An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

摘要翻译： 一种半导体制造装置的空气过滤装置和空气净化系统，以降低成本并提高制造生产率。 空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。 被构造成插入到框架中的缓冲框架可以包括多个狭槽部分，每个狭槽部分具有多个空气进/出孔，空气可以通过空气进入或离开缓冲器框架。 多个过滤器可以可释放地紧固到多个槽部分，以过滤包含在流过空气进/出孔的空气中的污染物质。 当更换多个过滤器时，可以使用用于中断通过空气入口/出口的空气的空气断路器，从而在更换期间向半导体制造装置提供净化的空气。

公开(公告)号：US20080137046A1

公开(公告)日：2008-06-12

申请号：US11999526

申请日：2007-12-06

申请人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

发明人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A substrate exposing apparatus includes an immersion exposure unit, disposed between a projection optical system and a substrate, including a vessel disposed on an optical path and filled with a liquid, a supply line connected to one side of the vessel to supply the liquid to the vessel, a first drain line connected to the other side of the vessel to drain the liquid from the vessel, and a monitoring unit including at least one first measuring unit connected to the first drain line to detect a property of the liquid flowing through the first drain line. The monitoring unit can include a collection line connected to the first drain line to collect the liquid, a first bath storing the collected liquid, and a first distribution line through which the liquid in the first bath can flow. The first measuring unit is installed on the first distribution line.

摘要翻译： 基板曝光装置包括设置在投影光学系统和基板之间的浸没曝光单元，包括设置在光路上并填充有液体的容器，连接到容器的一侧以将液体供应到 容器，连接到容器的另一侧的第一排出管线，以从容器排出液体;以及监测单元，其包括连接到第一排泄管线的至少一个第一测量单元，以检测流过第一流体的液体的性质 排水管线。 监视单元可以包括连接到第一排水管线以收集液体的收集管线，存储收集的液体的第一浴槽和第一浴液中的液体可以流过的第一分配管线。 第一个测量单元安装在第一个配线上。

公开(公告)号：US08027017B2

公开(公告)日：2011-09-27

申请号：US12321102

申请日：2009-01-15

申请人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

发明人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC分类号： G03B27/52

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

摘要翻译： 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

公开(公告)号：US20090180086A1

公开(公告)日：2009-07-16

申请号：US12321102

申请日：2009-01-15

申请人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

发明人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC分类号： G03B27/52 ,  B08B3/04 ,  B08B3/12 ,  B08B7/00

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

摘要翻译： 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。