公开(公告)号：US20110003405A1

公开(公告)日：2011-01-06

申请号：US12495827

申请日：2009-07-01

申请人： Chingwen Yeh ,  James B. Boyce ,  Kathleen Boyce ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

发明人： Chingwen Yeh ,  James B. Boyce ,  Kathleen Boyce ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

IPC分类号： H01L21/30

CPC分类号： B81C1/00158 ,  Y10T29/42

摘要： Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.

摘要翻译： 用于形成膜的方法和装置包括提供玻璃基板，以及在玻璃基板上沉积薄层的铬。 图案化薄层的铬以形成偏转电极和互连引线。 在图案化的铬层的顶部上沉积铝的牺牲层，然后将牺牲层图案化以限定锚定区域。 在牺牲层的顶部，沉积厚厚的铬层，并且将厚的铬层图案化以形成膜。 然后蚀刻牺牲层以释放膜。

公开(公告)号：US08058182B2

公开(公告)日：2011-11-15

申请号：US12495827

申请日：2009-07-01

申请人： Chingwen Yeh ,  James B. Boyce ,  Kathleen Boyce, legal representative ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

发明人： Chingwen Yeh ,  James B. Boyce ,  Jingkuang Chen ,  Feixia Pan ,  Joel A. Kubby

IPC分类号： H01L21/469

CPC分类号： B81C1/00158 ,  Y10T29/42

摘要： Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.

摘要翻译： 用于形成膜的方法和装置包括提供玻璃基板，以及在玻璃基板上沉积薄层的铬。 图案化薄层的铬以形成偏转电极和互连引线。 在图案化的铬层的顶部上沉积铝的牺牲层，然后将牺牲层图案化以限定锚定区域。 在牺牲层的顶部，沉积厚厚的铬层，并且将厚的铬层图案化以形成膜。 然后蚀刻牺牲层以释放膜。

公开(公告)号：US06532093B2

公开(公告)日：2003-03-11

申请号：US09731339

申请日：2000-12-06

申请人： Decai Sun ,  Michel A. Rosa ,  Chingwen Yeh

发明人： Decai Sun ,  Michel A. Rosa ,  Chingwen Yeh

IPC分类号： G02B2608

CPC分类号： G06K7/10702 ,  G02B26/0841 ,  G02B26/105 ,  G06K7/10653 ,  Y10S359/904

摘要： A micro-optical-electrical-mechanical laser scanner is configured from a silicon-on-insulator substrate having a silicon substrate layer, a buried oxide layer, and a single crystal silicon device layer. A first device layer portion having a micro-mirror fabricated therefrom. A laser is connected to a second device layer portion, and a hinge connects the first device layer portion and the second device layer portion. The hinge is formed with a bimorph material, wherein the bimorph material creates built-in stresses in the hinge. The bimorph hinge moves the released micro-mirror out of the horizontal plane to a position for either directly or indirectly reflecting laser light emitted from the laser.