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    AMINE AND DIAMINE COMPOUNDS AND THEIR USE FOR INVERSE FROTH FLOTATION OF SILICATE FROM IRON ORE
    2.
    发明申请
    AMINE AND DIAMINE COMPOUNDS AND THEIR USE FOR INVERSE FROTH FLOTATION OF SILICATE FROM IRON ORE 有权
    胺和二胺化合物及其用于从铁矿石中反射的硅酸盐的挥发物

    公开(公告)号：US20140021104A1

    公开(公告)日：2014-01-23

    申请号：US14110633

    申请日：2012-04-10

    申请人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich Von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    发明人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich Von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    IPC分类号： B03D1/02 ,  B03D1/01

    CPC分类号： B03D1/02 ,  B03D1/01 ,  B03D1/016 ,  B03D2201/02 ,  B03D2201/04 ,  B03D2201/06 ,  B03D2203/04 ,  C07C29/34 ,  C07C217/08

    摘要： The invention relates to a process for enriching an iron mineral from a silicate containing iron ore by inverse flotation comprising the addition of a collector or collector composition comprising at least one of the compounds of formulae RO—X—NH2 (Ia); RO—X—NH3+Y− (Ib); RO—X—NH—Z—NH2 (IIa); and RO—X—NH—Z—NH3+Y− (IIb), in which X is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Z is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Y− is an anion; and R is an aliphatic group of the formula (I) C5H11CH(C3H7)CH2— (I) wherein the C5H11 moeity of the aliphatic group of the formula (I) comprises 70 to 99% by weight n-C5H11—, and 1 to 30% by weight C2H5CH(CH3)CH2— and/or CH3CH(CH3)CH2CH2—. RO—X—NH2  (Ia) RO—X—NH3+Y−  (Ib) RO—X—NH—Z—NH2  (IIa) RO—X—NH—Z—NH3+Y−  (IIb) C5H11CH(C3H7)CH2—  (I)

    摘要翻译： 本发明涉及通过反浮选从含铁矿石的硅酸盐中富集铁矿物的方法，包括加入包含至少一种式RO-X-NH 2（Ia）化合物的收集器或收集器组合物; RO-X-NH 3 + Y-（Ib）; RO-X-NH-Z-NH 2（IIa）; 和RO-X-NH-Z-NH 3 + Y-（IIb），其中X是含有2至6个碳原子的直链或支链脂族亚烷基; Z是含有2至6个碳原子的直链或支链脂族亚烷基; Y-是阴离子; 并且R是式（I）的C 5 H 11 CH（C 3 H 7）CH 2 - （I）的脂族基团，其中式（I）的脂族基团的C 5 H 11摩尔含量为70至99重量％的n-C 5 H 11 - ，和1至 30重量％的C 2 H 5 CH（CH 3）CH 2 - 和/或CH 3 CH（CH 3）CH 2 CH 2 - 。 RO-X-NH2（Ia）RO-X-NH3 + Y-（Ib）RO-X-NH-Z-NH2（Ⅱa）RO-X-NH-Z-NH3 + Y-（IIb）C5H11CH（C3H7） CH2-（I）

    DIAMINE COMPOUNDS AND THEIR USE FOR INVERSE FROTH FLOTATION OF SILICATE FROM IRON ORE
    4.
    发明申请
    DIAMINE COMPOUNDS AND THEIR USE FOR INVERSE FROTH FLOTATION OF SILICATE FROM IRON ORE 有权
    DIAMINE化合物及其用于从铁矿石的硅酸盐的反向挥发

    公开(公告)号：US20140027354A1

    公开(公告)日：2014-01-30

    申请号：US14111187

    申请日：2012-04-04

    申请人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    发明人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    IPC分类号： B03D1/01 ,  B03D1/02

    CPC分类号： B03D1/01 ,  B03D1/0043 ,  B03D1/02 ,  B03D2201/02 ,  B03D2203/04 ,  C07C233/17 ,  C07C233/18

    摘要： The invention concerns a process for enriching an iron mineral from a silicate containing iron ore by inverse flotation comprising the addition of a collector or collector composition comprising at least one of the compounds of formulae RC(O)N(Z—O—X-NH2)2 (Ia); RC(O)N(Z-O-X-NH2)2H+ Y− (Ib); in which X is an aliphatic alkylene group containing 2 to 6 carbon atoms; Z is an aliphatic alkylene group containing 2 to 6 carbon atoms; Y− is an anion; and R is a saturated or unsaturated, linear or branched, aliphatic or aromatic moiety having between 7 and 23 carbon atoms. The invention also relates to the novel compounds according to formulae (Ia) and (Ib), compositions comprising said compounds and the use of compounds and formulations as collectors for enriching of iron mineral.

    摘要翻译： 本发明涉及通过反浮选从含铁矿石的硅酸盐中富集铁矿物的方法，包括加入收集物或收集器组合物，该组合物包含至少一种式RC（O）N（ZOX-NH 2）2（Ia ）; RC（O）N（Z-O-X-NH 2）2 H + Y-（Ib）; 其中X是含有2至6个碳原子的脂族亚烷基; Z是含有2至6个碳原子的脂族亚烷基; Y-是阴离子; 且R为具有7至23个碳原子的饱和或不饱和的直链或支链的脂族或芳族部分。 本发明还涉及根据式（Ia）和（Ib）的新化合物，包含所述化合物的组合物和使用化合物和制剂作为铁矿物富集的收集剂。

    Amine and diamine compounds and their use for inverse froth flotation of silicate from iron ore
    5.
    发明授权
    Amine and diamine compounds and their use for inverse froth flotation of silicate from iron ore 有权
    胺和二胺化合物及其用于从铁矿石中反相浮选硅酸盐的用途

    公开(公告)号：US09566590B2

    公开(公告)日：2017-02-14

    申请号：US14110633

    申请日：2012-04-10

    申请人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich Von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    发明人： Christian Bittner ,  Joerg Nieberle ,  Bernhard Ulrich Von Vacano ,  Alexsandro Berger ,  Roland Boehn ,  Guenter Oetter

    IPC分类号： B03D1/02 ,  B03D1/01 ,  C07C217/08 ,  B03D1/016 ,  C07C29/34

    CPC分类号： B03D1/02 ,  B03D1/01 ,  B03D1/016 ,  B03D2201/02 ,  B03D2201/04 ,  B03D2201/06 ,  B03D2203/04 ,  C07C29/34 ,  C07C217/08

    摘要： The invention relates to a process for enriching an iron mineral from a silicate containing iron ore by inverse flotation comprising the addition of a collector or collector composition comprising at least one of the compounds of formulae RO—X—NH2 (Ia); RO—X—NH3+Y− (Ib); RO—X—NH—Z—NH2 (IIa); and RO—X—NH—Z—NH3+Y− (IIb), in which X is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Z is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Y− is an anion; and R is an aliphatic group of the formula (I) C5H11CH(C3H7)CH2— (I) wherein the C5H11 moeity of the aliphatic group of the formula (I) comprises 70 to 99% by weight n-C5H11—, and 1 to 30% by weight C2H5CH(CH3)CH2— and/or CH3CH(CH3)CH2CH2—. RO—X—NH2  (Ia) RO—X—NH3+Y−  (Ib) RO—X—NH—Z—NH2  (IIa) RO—X—NH—Z—NH3+Y−  (IIb) C5H11CH(C3H7)CH2—  (I)

    摘要翻译： 本发明涉及通过反浮选从含铁矿石的硅酸盐中富集铁矿物的方法，包括加入包含至少一种式RO-X-NH 2（Ia）化合物的收集器或收集器组合物; RO-X-NH 3 + Y-（Ib）; RO-X-NH-Z-NH 2（IIa）; 和RO-X-NH-Z-NH 3 + Y-（IIb），其中X是含有2至6个碳原子的直链或支链脂族亚烷基; Z是含有2至6个碳原子的直链或支链脂族亚烷基; Y-是阴离子; 并且R是式（I）的C 5 H 11 CH（C 3 H 7）CH 2 - （I）的脂族基团，其中式（I）的脂族基团的C 5 H 11摩尔含量为70至99重量％的n-C 5 H 11 - ，和1至 30重量％的C 2 H 5 CH（CH 3）CH 2 - 和/或CH 3 CH（CH 3）CH 2 CH 2 - 。 RO-X-NH2（Ia）RO-X-NH3 + Y-（Ib）RO-X-NH-Z-NH2（Ⅱa）RO-X-NH-Z-NH3 + Y-（IIb）C5H11CH（C3H7） CH2-（I）

    Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
    7.
    发明授权
    Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less 有权
    用于制造集成电路器件，光学器件，微机械和机械精密器件的方法，其具有线间距尺寸为50nm以下的图案化材料层

    公开(公告)号：US09184057B2

    公开(公告)日：2015-11-10

    申请号：US14005746

    申请日：2012-02-29

    申请人： Andreas Klipp ,  Guenter Oetter ,  Sabrina Montero Pancera ,  Andrei Honciuc ,  Christian Bittner

    发明人： Andreas Klipp ,  Guenter Oetter ,  Sabrina Montero Pancera ,  Andrei Honciuc ,  Christian Bittner

    IPC分类号： G03F7/32 ,  G03F7/40 ,  H01L21/308 ,  G03F7/20

    CPC分类号： H01L21/3083 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/405

    摘要： A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.

    摘要翻译： 一种用于制造集成电路器件，光学器件，微机械和机械精密器件的方法，所述方法包括以下步骤：（1）提供具有线间距尺寸为50nm或更小的纵向比为> 2的图案化材料层的衬底 ; （2）通过使衬底与含有至少一种具有至少一个阳离子的至少一种无氟阳离子表面活性剂A的含水无氟溶液S接触至少一次来提供正电荷或负电荷的表面， 或潜在的阳离子基团，至少一种具有至少一个阴离子或潜在阴离子基团的至少一种无氟阴离子表面活性剂A或至少一种无氟两性表面活性剂A; 和（3）从与基板的接触中除去无水的无水溶液S.

    METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICES, OPTICAL DEVICES, MICROMACHINES AND MECHANICAL PRECISION DEVICES HAVING PATTERNED MATERIAL LAYERS WITH LINE-SPACE DIMENSIONS OF 50 NM AND LESS
    9.
    发明申请
    METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICES, OPTICAL DEVICES, MICROMACHINES AND MECHANICAL PRECISION DEVICES HAVING PATTERNED MATERIAL LAYERS WITH LINE-SPACE DIMENSIONS OF 50 NM AND LESS 有权
    用于制造集成电路装置的方法，光学装置，微型计算机和机械精密装置，具有50纳米的空间尺寸的图案材料层和较小的材料层

    公开(公告)号：US20140011366A1

    公开(公告)日：2014-01-09

    申请号：US14005746

    申请日：2012-02-29

    申请人： Andreas Klipp ,  Guenter Oetter ,  Sabrina Montero Pancera ,  Andrei Honciuc ,  Christian Bittner

    发明人： Andreas Klipp ,  Guenter Oetter ,  Sabrina Montero Pancera ,  Andrei Honciuc ,  Christian Bittner

    IPC分类号： H01L21/308

    CPC分类号： H01L21/3083 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/405

    摘要： A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.

    摘要翻译： 一种用于制造集成电路器件，光学器件，微机械和机械精密器件的方法，所述方法包括以下步骤：（1）提供具有线间距尺寸为50nm或更小的纵向比为> 2的图案化材料层的衬底 ; （2）通过使衬底与含有至少一种具有至少一个阳离子的至少一种无氟阳离子表面活性剂A的含水无氟溶液S接触至少一次来提供正电荷或负电荷的表面， 或潜在的阳离子基团，至少一种具有至少一个阴离子或潜在阴离子基团的至少一种无氟阴离子表面活性剂A或至少一种无氟两性表面活性剂A; 和（3）从与基板的接触中除去无水的无水溶液S.