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    Method for prioritizing production lots based on grade estimates and output requirements
    1.
    发明授权
    Method for prioritizing production lots based on grade estimates and output requirements 有权
    根据年龄估计和产出要求确定生产批次的方法

    公开(公告)号：US06699727B1

    公开(公告)日：2004-03-02

    申请号：US09821675

    申请日：2001-03-29

    申请人： Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Christopher A. Bode ,  Alexander J. Pasadyn ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    发明人： Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Christopher A. Bode ,  Alexander J. Pasadyn ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    IPC分类号： G01R3126

    CPC分类号： H01L22/20 ,  G05B19/418 ,  G05B2219/32194 ,  G05B2219/32263 ,  Y02P90/02 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/22

    摘要： A method for prioritizing production flow includes processing a plurality of manufactured items in a process flow; measuring characteristics of a plurality of manufactured items in the process flow; estimating performance grades for the plurality of manufactured items based on the measured characteristics; grouping the manufactured items with like estimated performance grades; assigning priorities to groups of manufactured items with like estimated performance grades; and directing the plurality of manufactured items through the process flow based on the assigned priorities. A manufacturing system includes a plurality of processing tools adapted to process a plurality of manufactured items in a process flow, a metrology tool, and a process control server. The metrology tool is adapted to measure characteristics of a plurality of manufactured items in the process flow. The process control server is adapted to estimate performance grades for the plurality of manufactured items based on the measured characteristics, group the manufactured items with like estimated performance grades, assign priorities to groups of manufactured items with like estimated performance grades, and direct the plurality of manufactured items through the process flow based on the assigned priorities.

    摘要翻译： 一种用于确定生产流程优先级的方法包括在处理流程中处理多个制造的物品; 测量处理流程中的多个制成品的特性; 基于所测量的特性来估计所述多个制造物品的性能等级; 对具有相似估计性能等级的制成品进行分组; 将优先事项分配给具有类似估计绩效等级的制成品组; 以及基于所分配的优先级，通过所述处理流程来引导所述多个制造的物品。 制造系统包括多个处理工具，其适用于处理流程中的多个制造物品，计量工具和过程控制服务器。 计量工具适于测量处理流程中的多个制造物品的特性。 过程控制服务器适于基于测量的特性来估计多个制造物品的性能等级，将具有相似估计性能等级的制造物品分组，将具有相似估计性能等级的制造商品组的优先级分配给多个 基于分配的优先级，通过流程流程制造出的物品。

    Method and apparatus for modeling thickness profiles and controlling subsequent etch process
    3.
    发明授权
    Method and apparatus for modeling thickness profiles and controlling subsequent etch process 有权
    用于建模厚度剖面和控制后续蚀刻工艺的方法和装置

    公开(公告)号：US06410351B1

    公开(公告)日：2002-06-25

    申请号：US09615481

    申请日：2000-07-13

    申请人： Christopher A. Bode ,  Anthony J. Toprac

    发明人： Christopher A. Bode ,  Anthony J. Toprac

    IPC分类号： H01L214763

    CPC分类号： H01L22/20

    摘要： A processing line includes a deposition tool, a metrology tool, an etch tool, and a process controller. The deposition tool is adapted to form a process layer on a plurality of wafers. The metrology tool is adapted to measure the thickness of the process layer for a sample of the wafers. The etch tool is adapted to etch the process layer in accordance with an operating recipe. The process controller is adapted to store a thickness profile model of the deposition tool, generate predicted process layer thicknesses for the wafers not measured by the metrology tool based on the process layer thickness measurements of the wafers in the sample and the thickness profile model, and modify the operating recipe of the etch tool based on the predicted process layer thicknesses. A method for controlling wafer uniformity includes storing a thickness profile model of a deposition tool; depositing a process layer on a plurality of wafers in the deposition tool; measuring the thickness of the process layer for a sample of the wafers; generating predicted process layer thicknesses for the wafers not measured based on the process layer thickness measurements and the thickness profile model; and etching the process layer in an etching tool in accordance with an operating recipe, the operating recipe being based on the predicted process layer thicknesses.

    摘要翻译： 处理线包括沉积工具，计量工具，蚀刻工具和过程控制器。 沉积工具适于在多个晶片上形成工艺层。 测量工具适于测量晶片样品的工艺层的厚度。 蚀刻工具适于根据操作配方蚀刻工艺层。 过程控制器适于存储沉积工具的厚度剖面模型，基于样品中的晶片的过程层厚度测量和厚度剖面模型，生成未被测量工具测量的晶片的预测处理层厚度，以及 基于预测的处理层厚度修改蚀刻工具的操作配方。 一种用于控制晶片均匀性的方法包括：存储沉积工具的厚度剖面模型; 在所述沉积工具中的多个晶片上沉积工艺层; 测量晶片样品的工艺层的厚度; 根据工艺层厚度测量和厚度剖面模型，生成未测量晶片的预测工艺层厚度; 并且根据操作配方在蚀刻工具中蚀刻处理层，操作配方基于预测的处理层厚度。

    Method and apparatus for integrating multiple process controllers
    5.
    发明授权
    Method and apparatus for integrating multiple process controllers 失效
    用于集成多个过程控制器的方法和设备

    公开(公告)号：US06801817B1

    公开(公告)日：2004-10-05

    申请号：US09789140

    申请日：2001-02-20

    申请人： Christopher A. Bode ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    发明人： Christopher A. Bode ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    IPC分类号： G06F1900

    CPC分类号： G05B19/41865 ,  G05B19/40937 ,  Y02P90/16 ,  Y02P90/20 ,  Y02P90/265

    摘要： A method for controlling a manufacturing system includes processing workpieces in a plurality of tools; initiating a baseline control script for a selected tool of the plurality of tools; providing context information for the baseline control script; determining a tool type based on the context information; selecting a group of control routines for the selected tool based on the tool type; determining required control routines from the group of control routines based on the context information; and executing the required control routines to generate control actions for the selected tool. A manufacturing system includes a plurality of tools adapted to process workpieces, a control execution manager, and a control executor. The control execution manager is adapted to initiate a baseline control script for a selected tool of the plurality of tools and provide context information for the baseline control script. The control executor is adapted to execute the baseline control script, determine a tool type based on the context information, select a group of control routines for the selected tool based on the tool type, determine required control routines from the group of control routines based on the context information, and execute the required control routines to generate control actions for the selected tool.

    摘要翻译： 一种用于控制制造系统的方法包括：处理多个工具中的工件; 为所述多个工具的所选择的工具启动基线控制脚本; 提供基线控制脚本的上下文信息; 基于上下文信息确定工具类型; 基于所述工具类型为所选择的工具选择一组控制例程; 基于所述上下文信息来确定来自所述一组控制例程的所需控制例程; 并执行所需的控制例程以产生所选择的工具的控制动作。 制造系统包括适于处理工件的多个工具，控制执行管理器和控制执行器。 所述控制执行管理器适于启动用于所述多个工具的所选工具的基线控制脚本并提供所述基线控制脚本的上下文信息。 控制执行器适于执行基线控制脚本，基于上下文信息确定工具类型，基于工具类型为所选择的工具选择一组控制例程，从基于控制例程的组中确定所需的控制例程 上下文信息，并执行所需的控制例程以生成所选择的工具的控制动作。

    Method and apparatus for run-to-run controlling of overlay registration
    7.
    发明授权
    Method and apparatus for run-to-run controlling of overlay registration 有权
    覆盖登记的运行控制方法和装置

    公开(公告)号：US06405096B1

    公开(公告)日：2002-06-11

    申请号：US09371550

    申请日：1999-08-10

    申请人： Anthony J. Toprac ,  Christopher A. Bode ,  Richard D. Edwards

    发明人： Anthony J. Toprac ,  Christopher A. Bode ,  Richard D. Edwards

    IPC分类号： G06F1900

    CPC分类号： G03F7/70633 ,  H01L22/20

    摘要： The present invention provides for a method and apparatus for correction of overlay control errors. Semiconductor devices are processed based upon control input parameters. The processed semiconductor devices are examined in a review station. The control input parameters are modified in response to the examination of the processed semiconductor devices. New control input parameters are implemented for a subsequent run of the semiconductor device processing step based upon the modification of the control input parameters.

    摘要翻译： 本发明提供了一种用于校正重叠控制误差的方法和装置。 基于控制输入参数来处理半导体器件。 处理的半导体器件在检查站中进行检查。 响应于对被处理的半导体器件的检查，修改控制输入参数。 基于控制输入参数的修改，实现新的控制输入参数用于随后的半导体器件处理步骤的运行。

    Method and apparatus for controlling process target values based on manufacturing metrics
    9.
    发明授权
    Method and apparatus for controlling process target values based on manufacturing metrics 失效
    基于制造指标控制过程目标值的方法和装置

    公开(公告)号：US06937914B1

    公开(公告)日：2005-08-30

    申请号：US09789872

    申请日：2001-02-21

    申请人： Christopher A. Bode ,  Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Michael L. Miller

    发明人： Christopher A. Bode ,  Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Michael L. Miller

    IPC分类号： G05B19/418 ,  G06F19/00

    CPC分类号： G05B19/41865 ,  G05B2219/32063 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/86

    摘要： A method for controlling a tool adapted to process workpieces in accordance with an operating recipe based on a process target value is provided. The method includes collecting manufacturing characteristic data associated with the workpieces; correlating the manufacturing characteristic data with a first manufacturing metric to generate a first manufacturing metric distribution for the workpieces; and adjusting the process target value based on the first manufacturing metric distribution. A manufacturing system includes a processing tool and a target monitor. The processing tool is adapted to process workpieces in accordance with an operating recipe based on a process target value. The target monitor is adapted to collect manufacturing characteristic data associated with the workpieces, correlate the manufacturing characteristic data with a first manufacturing metric to generate a first manufacturing metric distribution for the workpieces, and adjust the process target value based on the first manufacturing metric distribution.

    摘要翻译： 提供了一种用于控制适于根据基于过程目标值的操作配方来处理工件的工具的方法。 该方法包括收集与工件相关联的制造特性数据; 将所述制造特征数据与第一制造度量相关联，以产生所述工件的第一制造度量分布; 以及基于所述第一制造度量分布来调整所述过程目标值。 制造系统包括处理工具和目标监视器。 处理工具适于根据基于过程目标值的操作配方来处理工件。 目标监视器适于收集与工件相关联的制造特性数据，将制造特性数据与第一制造度量相关联，以产生工件的第一制造度量分布，并且基于第一制造度量分布来调整过程目标值。

    Method and apparatus for controlling a tool using a baseline control script
    10.
    发明授权
    Method and apparatus for controlling a tool using a baseline control script 有权
    使用基线控制脚本控制工具的方法和装置

    公开(公告)号：US06615098B1

    公开(公告)日：2003-09-02

    申请号：US09789871

    申请日：2001-02-21

    申请人： Christopher A. Bode ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    发明人： Christopher A. Bode ,  Alexander J. Pasadyn ,  Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    IPC分类号： G06F1760

    CPC分类号： G05B19/41865 ,  G05B19/0426 ,  G05B2219/32129 ,  G05B2219/36225 ,  G05B2219/45031 ,  Y02P90/20

    摘要： A method for controlling a manufacturing system includes processing workpieces in a plurality of tools; initiating a baseline control script for a selected tool of the plurality of tools; providing context information for the baseline control script; determining a tool type based on the context information; selecting a control routine for the selected tool based on the tool type; and executing the control routine to generate a control action for the selected tool. A manufacturing system includes a plurality of tools adapted to process workpieces, a control execution manager, and a control executor. The control execution manager is adapted to initiate a baseline control script for a selected tool of the plurality of tools and provide context information for the baseline control script. The control executor is adapted to execute the baseline control script, determine a tool type based on the context information, select a control routine for the selected tool based on the tool type, and execute the control routine to generate a control action for the selected tool.

    摘要翻译： 一种用于控制制造系统的方法包括：处理多个工具中的工件; 为所述多个工具的所选择的工具启动基线控制脚本; 提供基线控制脚本的上下文信息; 基于上下文信息确定工具类型; 根据刀具类型选择所选刀具的控制程序; 以及执行所述控制程序以产生所选择的工具的控制动作。 制造系统包括适于处理工件的多个工具，控制执行管理器和控制执行器。 所述控制执行管理器适于启动用于所述多个工具的所选工具的基线控制脚本并提供所述基线控制脚本的上下文信息。 控制执行器适于执行基线控制脚本，基于上下文信息确定工具类型，基于工具类型选择所选刀具的控制程序，并执行控制程序以生成所选刀具的控制动作 。