-
公开(公告)号：US20120196155A1
公开(公告)日：2012-08-02
申请号：US13193539
申请日：2011-07-28
申请人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
发明人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
摘要： A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
摘要翻译： 提供了一种形成磁性介质基板的方法和装置。 在具有磁敏感层的基板上形成图案化的抗蚀剂层。 在图案化的抗蚀剂层上形成保形层，以防止后续处理期间图案的劣化。 对衬底进行能量处理，其中能量物质根据形成在图案化抗蚀剂中的图案穿透图案化抗蚀剂和保形层的部分，撞击磁敏感层并改变其磁性。 然后去除图案化的抗蚀剂和共形保护层，留下具有基本上不变的形貌的磁性质图案的磁性基底。
-
公开(公告)号：US08658242B2
公开(公告)日：2014-02-25
申请号：US13193539
申请日：2011-07-28
申请人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
发明人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
IPC分类号： B05D5/12
摘要： A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
摘要翻译： 提供了一种形成磁性介质基板的方法和装置。 在具有磁敏感层的基底上形成图案化的抗蚀剂层。 在图案化的抗蚀剂层上形成保形层，以防止后续处理期间图案的劣化。 对衬底进行能量处理，其中能量物质根据形成在图案化抗蚀剂中的图案穿透图案化抗蚀剂和保形层的部分，撞击磁敏感层并改变其磁性。 然后去除图案化的抗蚀剂和共形保护层，留下具有基本上不变的形貌的磁性质图案的磁性基底。
-
3.发明授权公开(公告)号：US08354035B2
公开(公告)日：2013-01-15
申请号：US12821400
申请日：2010-06-23
申请人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
发明人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
IPC分类号： B44C1/22
摘要： A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
摘要翻译： 提供了从具有磁性活性表面的基板去除抗蚀剂材料的方法。 将基板设置在处理室中并暴露于由具有试剂，氧化剂和还原剂的气体混合物形成的含氟等离子体。 还可以包括清洁剂。 衬底可以通过背面冷却或通过冷却过程冷却，其中在等离子体处理被暂停时将冷却介质提供给处理室。 衬底可以翻转以进行双面处理，并且可以同时处理多个衬底。
-
4.发明申请公开(公告)号：US20110006034A1
公开(公告)日：2011-01-13
申请号：US12821400
申请日：2010-06-23
申请人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
发明人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
IPC分类号： G11B5/84
摘要： A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
摘要翻译： 提供了从具有磁性活性表面的基板去除抗蚀剂材料的方法。 将基板设置在处理室中并暴露于由具有试剂，氧化剂和还原剂的气体混合物形成的含氟等离子体。 还可以包括清洁剂。 衬底可以通过背面冷却或通过冷却过程冷却，其中在等离子体处理被暂停时将冷却介质提供给处理室。 衬底可以翻转以进行双面处理，并且可以同时处理多个衬底。
-
5.发明授权Temperature control of a substrate during a plasma ion implantation process for patterned disc media applications 有权在用于图案化盘式介质应用的等离子体离子注入工艺期间对衬底的温度控制公开(公告)号：US08586952B2
公开(公告)日：2013-11-19
申请号：US12916600
申请日：2010-10-31
申请人： Martin A. Hilkene , Matthew D. Scotney-Castle , Peter I. Porshnev , Roman Gouk , Steven Verhaverbeke
发明人： Martin A. Hilkene , Matthew D. Scotney-Castle , Peter I. Porshnev , Roman Gouk , Steven Verhaverbeke
IPC分类号： G21G5/00
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/746 , H01J37/32412
摘要： Embodiments of the invention provide a method of reducing thermal energy accumulation during a plasma ion implantation process for forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate. In one embodiment, a method of controlling a substrate temperature during a plasma ion implantation process includes (a) performing a first portion of a plasma ion implantation process on a substrate having a magnetically susceptible layer formed thereon in a processing chamber for a first time period, wherein a temperature of the substrate is maintained below about 150 degrees Celsius, (b) cooling the temperature of the substrate after the first portion of the plasma ion implantation process has been completed, and (c) performing a second portion of the plasma ion implantation process on the substrate, wherein the temperature of the substrate is maintained below 150 degrees Celsius.
摘要翻译： 本发明的实施例提供了一种在等离子体离子注入工艺期间减少热能积聚的方法，用于在衬底上的磁敏表面上形成包括磁性和非磁性畴的图案。 在一个实施例中，在等离子体离子注入过程期间控制衬底温度的方法包括（a）在处理室中在其上形成有敏感层的衬底上执行等离子体离子注入工艺的第一部分第一时间段 ，其中所述衬底的温度保持在约150摄氏度以下，（b）在所述等离子体离子注入工艺的所述第一部分完成之后冷却所述衬底的温度，以及（c）执行所述等离子体离子的第二部分 在衬底上的注入工艺，其中衬底的温度保持在150摄氏度以下。
-
6.发明申请TEMPERATURE CONTROL OF A SUBSTRATE DURING A PLASMA ION IMPLANTATION PROCESS FOR PATTERNED DISC MEDIA APPLICATIONS 有权用于图形盘介质应用的等离子体离子植入过程中的基板的温度控制公开(公告)号：US20110101247A1
公开(公告)日：2011-05-05
申请号：US12916600
申请日：2010-10-31
申请人： Martin A. Hilkene , Matthew D. Scotney-Castle , Peter I. Porshnev , Roman Gouk , Steven Verhaverbeke
发明人： Martin A. Hilkene , Matthew D. Scotney-Castle , Peter I. Porshnev , Roman Gouk , Steven Verhaverbeke
IPC分类号： G21G5/00
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/746 , H01J37/32412
摘要： Embodiments of the invention provide a method of reducing thermal energy accumulation during a plasma ion implantation process for forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate. In one embodiment, a method of controlling a substrate temperature during a plasma ion implantation process includes (a) performing a first portion of a plasma ion implantation process on a substrate having a magnetically susceptible layer formed thereon in a processing chamber for a first time period, wherein a temperature of the substrate is maintained below about 150 degrees Celsius, (b) cooling the temperature of the substrate after the first portion of the plasma ion implantation process has been completed, and (c) performing a second portion of the plasma ion implantation process on the substrate, wherein the temperature of the substrate is maintained below 150 degrees Celsius.
摘要翻译： 本发明的实施例提供了一种在等离子体离子注入工艺期间减少热能积聚的方法，用于在衬底上的磁敏表面上形成包括磁性和非磁性畴的图案。 在一个实施例中，在等离子体离子注入过程期间控制衬底温度的方法包括（a）在处理室中在其上形成有敏感层的衬底上执行等离子体离子注入工艺的第一部分第一时间段 ，其中所述衬底的温度保持在约150摄氏度以下，（b）在所述等离子体离子注入工艺的所述第一部分完成之后冷却所述衬底的温度，以及（c）执行所述等离子体离子的第二部分 在衬底上的注入工艺，其中衬底的温度保持在150摄氏度以下。
-
7.发明授权Demagnetization of magnetic media by C doping for HDD patterned media application 有权通过C掺杂磁性介质对HDD图案媒体应用进行退磁公开(公告)号：US09376746B2
公开(公告)日：2016-06-28
申请号：US13715786
申请日：2012-12-14
CPC分类号： C23C14/5826 , C23C14/042 , C23C14/0605 , C23C14/48 , C23C14/5873 , G11B5/62 , G11B5/85 , G11B5/851 , G11B5/858
摘要： Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.
摘要翻译： 本文所述的实施方案提供了用于处理具有通过印刷的氧反应性掩模将离子注入到磁性基底的磁性活性表面中的其上形成有印记的氧反应性掩模的磁性基底的方法和装置，其中离子不会减少氧 掩模的反应性，以及通过将衬底暴露于含氧等离子体来除去掩模。 掩模可以是无定形碳，将含碳离子注入到磁性活性表面中。 也可以含有氢的含碳离子可以通过活化烃气体和氢气的混合物而形成。 可以选择或调节氢气和烃气体的比例以控制离子注入。
-
8.发明申请DEMAGNETIZATION OF MAGNETIC MEDIA BY C DOPING FOR HDD PATTERNED MEDIA APPLICATION 有权用于硬盘图形媒体应用程序的磁性介质的去磁公开(公告)号：US20130164455A1
公开(公告)日：2013-06-27
申请号：US13715786
申请日：2012-12-14
IPC分类号： C23C14/48
CPC分类号： C23C14/5826 , C23C14/042 , C23C14/0605 , C23C14/48 , C23C14/5873 , G11B5/62 , G11B5/85 , G11B5/851 , G11B5/858
摘要： Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.
摘要翻译： 本文所述的实施方案提供了用于处理具有通过印刷的氧反应性掩模将离子注入到磁性基底的磁性活性表面中的其上形成有印记的氧反应性掩模的磁性基底的方法和装置，其中离子不会减少氧 掩模的反应性，以及通过将衬底暴露于含氧等离子体来除去掩模。 掩模可以是无定形碳，将含碳离子注入到磁性活性表面中。 也可以含有氢的含碳离子可以通过活化烃气体和氢气的混合物而形成。 可以选择或调节氢气和烃气体的比例以控制离子注入。
-
公开(公告)号：US20110104393A1
公开(公告)日：2011-05-05
申请号：US12939713
申请日：2010-11-04
IPC分类号： C23C14/04
CPC分类号： G11B5/855 , H01J37/321 , H01J37/32412
摘要： Processes and apparatus of forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate are provided. In one embodiment, a method of forming a pattern of magnetic domains on a magnetically susceptible material disposed on a substrate includes exposing a first portion of a magnetically susceptible layer to a plasma formed from a gas mixture, wherein the gas mixture includes at least a halogen containing gas and a hydrogen containing gas for a time sufficient to modify a magnetic property of the first portion of the magnetically susceptible layer exposed through a mask layer from a first state to a second state.
摘要翻译： 提供了在基板上的磁敏表面上形成包括磁性和非磁畴的图案的方法和装置。 在一个实施例中，在设置在基板上的易磁敏材料上形成磁畴图案的方法包括将磁敏感层的第一部分暴露于由气体混合物形成的等离子体，其中气体混合物至少包含卤素 含有气体和含氢气体的时间足以将通过掩模层暴露的易受敏感层的第一部分的磁特性从第一状态改变到第二状态。
-
10.发明授权Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantation 有权通过等离子体浸没离子注入在磁图形化过程中的衬底表面平面化方法公开(公告)号：US08673162B2
公开(公告)日：2014-03-18
申请号：US12965318
申请日：2010-12-10
CPC分类号： G11B5/855 , G11B5/8404 , G11B5/851
摘要： A method and apparatus for planarizing magnetically susceptible layers of substrates is provided. A patterned resist is formed on the magnetically susceptible layer, and the substrate is subjected to a plasma immersion ion implantation process to change a magnetic property of the magnetically susceptible layer according to the pattern of the resist material. The substrate is subjected to a plasma material removal process either before or after the implantation process to planarize the surface of the magnetically susceptible layer resulting from the implantation process. The plasma material removal process may be directional or non-directional.
摘要翻译： 提供了一种用于平坦化磁敏感层的基板的方法和装置。 在磁敏层上形成图案化的抗蚀剂，并且对基片进行等离子体浸没离子注入工艺，以根据抗蚀剂材料的图案改变磁敏层的磁特性。 在注入工艺之前或之后对衬底进行等离子体材料去除处理，以平坦化由植入工艺产生的易磁化层的表面。 等离子体材料去除过程可以是有向的或非定向的。
-
-
-
-
-
-
-
-
-
搜索结果
25 条记录 (耗时 0.091 秒)
