公开(公告)号：US20110094679A1

公开(公告)日：2011-04-28

申请号：US12968607

申请日：2010-12-15

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, JR.

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, JR.

IPC分类号： C23F1/08

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.

摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。

公开(公告)号：US08617352B2

公开(公告)日：2013-12-31

申请号：US12968607

申请日：2010-12-15

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

IPC分类号： C23F1/08

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.

公开(公告)号：US07563380B2

公开(公告)日：2009-07-21

申请号：US10819225

申请日：2004-04-07

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

IPC分类号： B23H9/00

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.

摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。

公开(公告)号：US20080295966A1

公开(公告)日：2008-12-04

申请号：US12188667

申请日：2008-08-08

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, JR.

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, JR.

IPC分类号： C23F1/08

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.

摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。

公开(公告)号：US07883602B2

公开(公告)日：2011-02-08

申请号：US12188667

申请日：2008-08-08

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick ,  Gary A. Orbeck ,  Donald A. Seccombe, Jr.

IPC分类号： C23F1/08 ,  H01J37/32

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.

摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。

公开(公告)号：US07387738B2

公开(公告)日：2008-06-17

申请号：US10425405

申请日：2003-04-28

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

IPC分类号： B23H3/00

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.

摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。

公开(公告)号：US20080149690A1

公开(公告)日：2008-06-26

申请号：US12042055

申请日：2008-03-04

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

IPC分类号： B23K1/20

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.

摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。

公开(公告)号：US08119016B2

公开(公告)日：2012-02-21

申请号：US12042055

申请日：2008-03-04

申请人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

发明人： Chun Christine Dong ,  Wayne Thomas McDermott ,  Alexander Schwarz ,  Gregory Khosrov Arslanian ,  Richard E. Patrick

IPC分类号： B23K1/20

CPC分类号： H01J37/32431 ,  B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01L21/31116 ,  H01L21/67069 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.

摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。

公开(公告)号：US20090223831A1

公开(公告)日：2009-09-10

申请号：US12119701

申请日：2008-05-13

申请人： Chun Christine Dong ,  Richard E. Patrick ,  Gregory Khosrov Arslanian

发明人： Chun Christine Dong ,  Richard E. Patrick ,  Gregory Khosrov Arslanian

IPC分类号： C25F5/00

CPC分类号： B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01J37/32431 ,  H01L21/31116 ,  H01L21/67069 ,  H05K3/3489 ,  H05K2203/087 ,  H05K2203/105 ,  H05K2203/1157

摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.

摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。

公开(公告)号：US07897029B2

公开(公告)日：2011-03-01

申请号：US12119701

申请日：2008-05-13

申请人： Chun Christine Dong ,  Richard E. Patrick ,  Gregory Khosrov Arslanian

发明人： Chun Christine Dong ,  Richard E. Patrick ,  Gregory Khosrov Arslanian

IPC分类号： C25F5/00

CPC分类号： B23K1/008 ,  B23K1/206 ,  B23K35/268 ,  B23K35/38 ,  C23G5/00 ,  H01J37/32431 ,  H01L21/31116 ,  H01L21/67069 ,  H05K3/3489 ,  H05K2203/087 ,  H05K2203/105 ,  H05K2203/1157

摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.

摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。