公开(公告)号：US20070154182A1

公开(公告)日：2007-07-05

申请号：US11333769

申请日：2006-01-17

申请人： Chung-Song Kuo ,  Shih-Ming Chang ,  Meng-Tze Liu ,  Jiun-Kuei Jung ,  Fu-Sheng Chu

发明人： Chung-Song Kuo ,  Shih-Ming Chang ,  Meng-Tze Liu ,  Jiun-Kuei Jung ,  Fu-Sheng Chu

IPC分类号： H04N7/00

CPC分类号： G11B27/36 ,  G11B20/10527 ,  G11B2020/10537 ,  G11B2020/10666 ,  G11B2220/2516 ,  H04N5/775 ,  H04N5/782

摘要： In a signal pickup method of a video/audio recording and playing system, a recording length and a tracing-back length are preset. An external signal is received and storing into a buffer of the video/audio recording and playing system. A designated section of the external signal is automatically picked up from the buffer according to the recording length and the tracing-back length in response to a triggering operation of a user.

摘要翻译： 在视频/音频记录和播放系统的信号拾取方法中，预设了记录长度和追溯长度。 外部信号被接收并存储到视频/音频记录和播放系统的缓冲器中。 响应于用户的触发操作，根据记录长度和追溯长度自动从缓冲器拾取外部信号的指定部分。

公开(公告)号：US08572520B2

公开(公告)日：2013-10-29

申请号：US13409515

申请日：2012-03-01

申请人： Chih-Shiang Chou ,  Ya-Ting Chang ,  Fu-Sheng Chu ,  Yu-Po Tang

发明人： Chih-Shiang Chou ,  Ya-Ting Chang ,  Fu-Sheng Chu ,  Yu-Po Tang

IPC分类号： G06F17/50 ,  G06G7/62

CPC分类号： G03F1/70 ,  G03F1/36

摘要： Integrated circuit (IC) methods for optical proximity correction (OPC) modeling and mask repair are described. The methods include use of an optical model that generates a simulated aerial image from an actual aerial image obtained in an optical microscope system. In the OPC modeling methods, OPC according to stage modeling is simulated, and OPC features may be added to a design layout according to the simulating OPC. In the mask repair methods, inverse image rendering is performed on the actual aerial image and diffraction image by applying an optical model that divides an incoherent exposure source into a plurality of coherent sources.

摘要翻译： 描述了用于光学邻近校正（OPC）建模和掩模修复的集成电路（IC）方法。 这些方法包括使用从在光学显微镜系统中获得的实际空间图像生成模拟空间图像的光学模型。 在OPC建模方法中，根据阶段建模对OPC进行了仿真，根据模拟OPC可以将OPC特征加入到设计布局中。 在掩模修复方法中，通过应用将非相干曝光源分割为多个相干光源的光学模型，对实际的空间图像和衍射图像执行逆图像渲染。

公开(公告)号：US08928973B2

公开(公告)日：2015-01-06

申请号：US13328591

申请日：2011-12-16

申请人： Fu-Sheng Chu ,  Chih-Shiang Chou ,  Yu-Po Tang ,  Yan-Ying He

发明人： Fu-Sheng Chu ,  Chih-Shiang Chou ,  Yu-Po Tang ,  Yan-Ying He

IPC分类号： G02B21/00

CPC分类号： G02B21/14 ,  G02B21/36 ,  G02B26/06

摘要： A microscope apparatus includes a condenser lens to make an illuminating electromagnetic wave relatively homogeneous, a first beam splitter splitting the illuminating electromagnetic wave after the condenser lens, a movable reflector module, a second beam splitter, an objective lens to project the illuminating electromagnetic wave propagating after an object to be observed toward an observing device. The object is loaded between the first beam splitter and the second beam splitter. The microscope apparatus is configured to split the illuminating electromagnetic wave into two paths at the first beam splitter. A first path goes through the first and the second beam splitters, and a second path goes through the movable reflector module to rejoin the first path at the second beam splitter. The microscope apparatus is configured acquire phase images with interferences of the electromagnetic wave from the two paths with at least two distance settings of the movable reflector module.

摘要翻译： 显微镜装置包括：聚光透镜，用于使照明电磁波相对均匀;第一分束器，分离聚光透镜后的照明电磁波;可移动反射器模块;第二分束器;物镜，用于投射照射电磁波; 在要观察的物体之后朝向观察装置。 物体被装载在第一分束器和第二分束器之间。 显微镜装置被配置为在第一分束器处将照明电磁波分成两个路径。 第一路径穿过第一和第二分束器，并且第二路径穿过可移动反射器模块以在第二分束器处重新加入第一路径。 显微镜装置被配置为获得具有来自两个路径的电磁波干扰的相位图像，其中可移动反射器模块具有至少两个距离设置。

公开(公告)号：US20130232454A1

公开(公告)日：2013-09-05

申请号：US13409515

申请日：2012-03-01

申请人： Chih-Shiang Chou ,  Ya-Ting Chang ,  Fu-Sheng Chu ,  Yu-Po Tang

发明人： Chih-Shiang Chou ,  Ya-Ting Chang ,  Fu-Sheng Chu ,  Yu-Po Tang

IPC分类号： G06F17/50

CPC分类号： G03F1/70 ,  G03F1/36

摘要： Integrated circuit (IC) methods for optical proximity correction (OPC) modeling and mask repair are described. The methods include use of an optical model that generates a simulated aerial image from an actual aerial image obtained in an optical microscope system. In the OPC modeling methods, OPC according to stage modeling is simulated, and OPC features may be added to a design layout according to the simulating OPC. In the mask repair methods, inverse image rendering is performed on the actual aerial image and diffraction image by applying an optical model that divides an incoherent exposure source into a plurality of coherent sources.

摘要翻译： 描述了用于光学邻近校正（OPC）建模和掩模修复的集成电路（IC）方法。 这些方法包括使用从在光学显微镜系统中获得的实际空间图像生成模拟空间图像的光学模型。 在OPC建模方法中，根据阶段建模对OPC进行了仿真，根据模拟OPC可以将OPC特征加入到设计布局中。 在掩模修复方法中，通过应用将非相干曝光源分割为多个相干光源的光学模型，对实际的空间图像和衍射图像执行逆图像渲染。