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公开(公告)号:US20250107162A1
公开(公告)日:2025-03-27
申请号:US18585438
申请日:2024-02-23
Inventor: Kuen-Ting SHIU , Suman BANERJEE , Claude ORTOLLAND , Marc L. TARABBIA , Caitlin BRANDON , Jin TANG
IPC: H01L29/06 , H01L21/762 , H01L27/02 , H01L29/08
Abstract: A semiconductor structure may include a substrate having a surface, an isolation structure formed on the surface, an active region formed on the surface adjacent to the isolation structure, a gate extended over the isolation structure and the active region, and a source region formed within the active region. The source region may include a first subregion formed adjacent to a first portion of the gate and the isolation structure, the first subregion having a first doping and a second subregion formed adjacent to a second portion of the gate, wherein the second subregion has a second doping different from the first doping.