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公开(公告)号：US10886506B2
公开(公告)日：2021-01-05
申请号：US15561704
申请日：2016-03-30
Applicant: DAI NIPPON PRINTING CO., LTD.
Inventor： Kaoru Miyazaki , Hirotoshi Sakamoto , Yousuke Hayakawa , Rikiya Yamashita , Takanori Yamashita , Tsuyoshi Suzuki , Yoichi Mochizuki , Kazuhiko Yokota , Tetsuya Ojiri
Abstract: Provided is a cell packaging material having a high insulating performance and durability. A cell packaging material comprising a layered body provided with at least a substrate layer, a metal layer, an adhesive layer, and a heat-fusible resin layer in the stated order. The adhesive layer has a resin composition that contains an acid-modified polyolefin and an epoxy resin. In probe displacement amount measurements involving the use of a thermal mechanical analyzer, when a probe is placed on the surface of the adhesive layer at an end part of the cell packaging material and the probe is heated from 40° C. to 220° C., the position of the probe does not drop in relation to the initial value.
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公开(公告)号：US20150275349A1
公开(公告)日：2015-10-01
申请号：US14429899
申请日：2013-09-26
Applicant: DAI NIPPON PRINTING CO., LTD.
Inventor： Shigeki Matsui , Tatsuo Asuma , Teruhisa Komuro , Hiroshi Miyama , Takakazu Goto , Kaoru Miyazaki , Hiroshi Matsuzaki
CPC classification number: C23C14/081 , B32B7/12 , B32B2255/20 , B32B2307/31 , B32B2307/412 , B32B2307/7242 , B32B2439/00 , C23C14/021 , C23C14/562 , Y10T428/24843 , Y10T428/265 , Y10T428/2826
Abstract: Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (21), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.
Abstract translation: 采用辊式连续蒸镀膜形成装置，其中成膜部分和设有等离子体预处理装置的预处理部分彼此间隔地排列成一列。 利用高速运送的基板，通过等离子体预处理装置将等离子体（P）供给到基板表面侧，同时将等离子体供给到封装在预处理辊中的空间中的基板（S） 并且被包围在用于供应等离子体形成气体的等离子体供给装置和作为磁性形成装置的磁体（21）中。 在基板（S）的表面上形成活性预处理表面。 在基板的预处理表面上立即高速连续地形成以Al-C共价键为主要成分的氧化铝作为主要成分的无机氧化物蒸镀膜，生成高粘合性的透明蒸镀膜。
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公开(公告)号：US09822440B2
公开(公告)日：2017-11-21
申请号：US14429899
申请日：2013-09-26
Applicant: Dai Nippon Printing Co., Ltd.
Inventor： Shigeki Matsui , Tatsuo Asuma , Teruhisa Komuro , Hiroshi Miyama , Takakazu Goto , Kaoru Miyazaki , Hiroshi Matsuzaki
CPC classification number: C23C14/081 , B32B7/12 , B32B2255/20 , B32B2307/31 , B32B2307/412 , B32B2307/7242 , B32B2439/00 , C23C14/021 , C23C14/562 , Y10T428/24843 , Y10T428/265 , Y10T428/2826
Abstract: Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (21), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.
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