公开(公告)号：US20140060423A1

公开(公告)日：2014-03-06

申请号：US13969995

申请日：2013-08-19

Applicant: DAINIPPON SCREEN MFG. CO., LTD.

Inventor： Hitoshi NAKAI ,  Yasuhiko OHASHI

IPC: B05C11/10

CPC classification number: H01L21/67023 ,  B05C5/02 ,  B05C9/04 ,  B05C11/1039 ,  B05C11/1044 ,  B08B3/041 ,  B08B11/00 ,  H01L21/00 ,  H01L21/02057 ,  H01L21/30604 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68764

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

Abstract translation: 基板处理装置包括室，基板保持部，基板旋转机构，液体接收部和上喷嘴。 该室包括一个室主体和一个室盖，室盖上下移动。 当室盖与室主体接触时，形成小的密封空间，并且执行包括减压或加压的一些处理。 当室盖向上移动时，在室盖和室主体之间形成一个环形开口。 在相对于环形开口的外侧，定位为第一杯部分和第二杯部分。 从基板溅射的处理液体被第一杯部或第二杯部接收。 在基板处理装置中，可以在小室中进行各种处理。