VAPOR CHAMBER WITH SUPPORT STRUCTURE
    1.
    发明公开

    公开(公告)号:US20230339053A1

    公开(公告)日:2023-10-26

    申请号:US18215022

    申请日:2023-06-27

    CPC classification number: B23P15/26 F28D15/04 F28D15/0233 B23K26/21 F28F19/00

    Abstract: A vapor chamber with a support structure is provided. The vapor chamber with the support structure includes a first plate, a second plate spaced apart from the first plate, and multiple support elements fixed between the first and second plates. On an outer surface of any of the first plate or the second plate, laser welding is performed on positions corresponding to the support elements so as to join the support elements to the first and second plates and to form weld ports on the outer surface of any of the plates. The invention solves the problem of fixing the support structure inside the thin vapor chamber, and therefore mass production can be realized.

    VAPOR CHAMBER WITH SUPPORT STRUCTURE AND MANUFACTURING METHOD THEREFOR

    公开(公告)号:US20210247153A1

    公开(公告)日:2021-08-12

    申请号:US17243480

    申请日:2021-04-28

    Abstract: A vapor chamber with a support structure and its manufacturing method are provided. The vapor chamber with the support structure includes a first plate, a second plate spaced apart from the first plate, and multiple support elements fixed between the first and second plates. On an outer surface of any of the first plate or the second plate, laser welding is performed on positions corresponding to the support elements so as to join the support elements to the first and second plates and to form weld ports on the outer surface of any of the plates. The invention solves the problem of fixing the support structure inside the thin vapor chamber, and therefore mass production can be realized.

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