公开(公告)号：US20220213235A1

公开(公告)日：2022-07-07

申请号：US17609987

申请日：2020-05-08

Applicant: Denka Company Limited

Inventor： Atsunori KONDO ,  Takashi SUNADA

IPC: C08C19/20 ,  C08L11/00 ,  C08K5/3445 ,  C08K5/47

Abstract: A sulfur-modified chloroprene rubber having a functional group A represented by specific General Formula (A) and positioned at a molecular terminal and a functional group B represented by specific General Formula (B) and positioned at a molecular terminal, in which a mass ratio B/A of a content of the functional group B with respect to a content of the functional group A is more than 0 and 6.00 or less, and a total amount of the functional group A and the functional group B is 0.10 to 0.60% by mass.

公开(公告)号：US20220002526A1

公开(公告)日：2022-01-06

申请号：US17291386

申请日：2019-11-06

Applicant: DENKA COMPANY LIMITED

Inventor： Atsunori KONDO ,  Takashi SUNADA

IPC: C08L11/00 ,  C08K5/47 ,  C08K5/38 ,  C08L33/20

Abstract: A chloroprene rubber composition containing 100 parts by mass of a chloroprene-based rubber, 0.5 to 5.0 parts by mass of a sulfur-based compound represented by General Formula (1) below, and more than 0 parts by mass and 2.0 parts by mass or less of a xanthogen disulfide compound represented by General Formula (2) below. [In the formula, R1 represents a hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 8 carbon atoms, and R2 and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.] [In the formula, R4 and R5 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.]

公开(公告)号：US20230399498A1

公开(公告)日：2023-12-14

申请号：US18249787

申请日：2021-08-04

Applicant: Denka Company Limited

Inventor： Atsunori KONDO ,  Nobuhiko FUJII

IPC: C08L11/00

CPC classification number: C08L11/00

Abstract: A rubber composition of a first embodiment contains 100 parts by mass of a chloroprene polymer, more than 0 parts by mass and 25 parts by mass or less of a diene-based polymer having an epoxy group, and 0.3 to 1.8 parts by mass of an organic peroxide, in which the chloroprene polymer includes a copolymer of chloroprene. A rubber composition of a second embodiment contains 100 parts by mass of a chloroprene polymer, more than 0 parts by mass and 25 parts by mass or less of a diene-based polymer having an epoxy group, and 0.3 to 1.8 parts by mass of an organic peroxide, in which the chloroprene polymer includes a homopolymer of chloroprene.

公开(公告)号：US20230383102A1

公开(公告)日：2023-11-30

申请号：US18249463

申请日：2021-08-05

Applicant: Denka Company Limited

Inventor： Atsunori KONDO ,  Nobuhiko FUJII

IPC: C08L11/00

CPC classification number: C08L11/00

Abstract: A rubber composition containing 100 parts by mass of a chloroprene polymer, more than 0 parts by mass and 25 parts by mass or less of a diene-based polymer having an epoxy group, and 0.2 to 2.5 parts by mass of at least one selected from the group consisting of a thiourea compound and a thiazolidinethione compound. A vulcanizate and a vulcanized molded article of the rubber composition.

公开(公告)号：US20220396717A1

公开(公告)日：2022-12-15

申请号：US17623502

申请日：2020-08-11

Applicant: DENKA COMPANY LIMITED

Inventor： Manabu MIURA ,  Daisuke YOSHIMURA ,  Naoki KOBAYASHI ,  Atsunori KONDO

IPC: C09J7/21 ,  C09J11/04 ,  C09J11/06

Abstract: An adhesive tape can reduce percussive sounds or friction sounds, can prevent contamination of a covered article due to contamination by dirt or dust or intrusion by water or oil, has durability against puncture or friction, and easily bends after binding a covered article. The adhesive tape having a substrate including 100 parts by mass of a polyvinyl chloride and, with respect to the 100 parts by mass of the polyvinyl chloride, 10-100 parts by mass of an elastomer and 10-100 parts by mass of a plasticizer, wherein the elastomer includes an acrylonitrile monomer unit and at least one monomer unit selected from the group made of a chloroprene monomer unit, a butadiene monomer unit, and an isoprene monomer unit and the adhesive tape has an attenuation value of 2 dB or greater in an acoustic absorption test.

公开(公告)号：US20230383082A1

公开(公告)日：2023-11-30

申请号：US18249839

申请日：2021-09-10

Applicant: Denka Company Limited

Inventor： Atsunori KONDO ,  Takashi SUNADA

IPC: C08J9/06 ,  C08J9/00 ,  C08J9/228

CPC classification number: C08J9/06 ,  C08J9/0033 ,  C08J9/228 ,  C08J2311/00

Abstract: A rubber foam composition containing a sulfur-modified chloroprene rubber and a chemical foaming agent, in which the sulfur-modified chloroprene rubber has a functional group A represented by specific General Formula (A) and positioned at a molecular terminal, in the sulfur-modified chloroprene rubber, a mass ratio B/A of a content of a functional group B represented by specific General Formula (B) and positioned at a molecular terminal with respect to a content of the functional group A is 12.00 or less, a total amount of the functional group A and the functional group B is 0.10 to 1.00% by mass, and a content of the chemical foaming agent is 3 to 16 parts by mass with respect to a total of 100 parts by mass of the sulfur-modified chloroprene rubber, a thiazole compound, and a dithiocarbamic acid-based compound.

公开(公告)号：US20220010097A1

公开(公告)日：2022-01-13

申请号：US17291367

申请日：2019-11-06

Applicant: DENKA COMPANY LIMITED

Inventor： Suguru ONUKI ,  Wataru NISHINO ,  Atsunori KONDO ,  Yuhei ISHIGAKI ,  Naoki KOBAYASHI

IPC: C08K5/38 ,  C08F236/12

Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.

公开(公告)号：US20210395422A1

公开(公告)日：2021-12-23

申请号：US17291347

申请日：2019-11-06

Applicant: DENKA COMPANY LIMITED

Inventor： Wataru NISHINO ,  Suguru ONUKI ,  Atsunori KONDO ,  Yuhei ISHIGAKI ,  Naoki KOBAYASHI

IPC: C08F236/18 ,  C08F220/44

Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.

公开(公告)号：US20240376244A1

公开(公告)日：2024-11-14

申请号：US18686971

申请日：2022-09-07

Applicant: Denka Company Limited

Inventor： Seiya TOMIZAWA ,  Atsunori KONDO

IPC: C08F279/02 ,  C08J3/24 ,  C08K3/04 ,  C08K3/36 ,  C08K5/25

Abstract: Provided is a rubber composition capable of improving the scorch time of the unvulcanized product, and the hardness, tensile strength, and freeze resistance of the vulcanizate in a well-balanced manner.
According to the present invention, there is provided a rubber composition including a chloroprene-based rubber having a content of an unsaturated nitrile monomer unit of less than 25% by mass and an epoxy compound having a weight average molecular weight more than 100 and less than 900, wherein the rubber composition contains 0.1 to 25 parts by mass of the epoxy compound with respect to 100 parts by mass of the chloroprene-based rubber.

公开(公告)号：US20230399497A1

公开(公告)日：2023-12-14

申请号：US18033638

申请日：2021-11-19

Applicant: DENKA COMPANY LIMITED

Inventor： Yuki SAKAI ,  Atsunori KONDO

IPC: C08L11/00 ,  C08K5/14 ,  C08K5/3415 ,  C08K5/372 ,  C08K3/08

CPC classification number: C08L11/00 ,  C08K5/14 ,  C08K5/3415 ,  C08K5/372 ,  C08K3/08 ,  C08K2201/014 ,  C08K2003/0893

Abstract: A chloroprene-based rubber composition capable of obtaining a vulcanizate having excellent compression set resistance and excellent heat resistance, a vulcanizate of the chloroprene-based rubber composition, and a vulcanized molded body of the chloroprene-based rubber composition having excellent compression set resistance and heat resistance. A chloroprene-based rubber composition including 100 parts by mass of a chloroprene-based rubber, 0.1 to 10 parts by mass of an organic peroxide, and 0.1 to 40 parts by mass of a compound having one or more thioether structures is provided.