公开(公告)号：US20220010097A1

公开(公告)日：2022-01-13

申请号：US17291367

申请日：2019-11-06

Applicant: DENKA COMPANY LIMITED

Inventor： Suguru ONUKI ,  Wataru NISHINO ,  Atsunori KONDO ,  Yuhei ISHIGAKI ,  Naoki KOBAYASHI

IPC: C08K5/38 ,  C08F236/12

Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.

公开(公告)号：US20210395422A1

公开(公告)日：2021-12-23

申请号：US17291347

申请日：2019-11-06

Applicant: DENKA COMPANY LIMITED

Inventor： Wataru NISHINO ,  Suguru ONUKI ,  Atsunori KONDO ,  Yuhei ISHIGAKI ,  Naoki KOBAYASHI

IPC: C08F236/18 ,  C08F220/44

Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.

公开(公告)号：US20240352175A1

公开(公告)日：2024-10-24

申请号：US18686594

申请日：2022-09-21

Applicant: DENKA COMPANY LIMITED

Inventor： Wataru NISHINO ,  Ibuki SHIMOTOMAI ,  Yutaka SAITO ,  Yushi KUMAGAI

IPC: C08F293/00 ,  C08K5/05

CPC classification number: C08F293/005 ,  C08K5/05 ,  C08F2438/03 ,  C08K2201/019

Abstract: Provided are a chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition with which it is possible to obtain a molded body having excellent tensile strength at break and tensile elongation at break even with use of less or no vulcanizing agent or vulcanization accelerator.
A chloroprene-based block copolymer including 30 to 60% by mass of a polymer block (A) derived from a monomer that can yield a polymer with a glass transition temperature of 80° C. or higher when homopolymerized and 40 to 70% by mass of a chloroprene-based polymer block (B) having a chloroprene monomer unit and a polyfunctional monomer unit.

公开(公告)号：US20240182618A1

公开(公告)日：2024-06-06

申请号：US18552828

申请日：2022-03-07

Applicant: Denka Company Limited

Inventor： Wataru NISHINO ,  Suguru ONUKI ,  Ryotaro ANDO

IPC: C08F236/12

CPC classification number: C08F236/12 ,  C08F2800/20

Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has a peak top at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is more than 1.1/100 and 2.3/100 or less, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.

公开(公告)号：US20240158555A1

公开(公告)日：2024-05-16

申请号：US18552801

申请日：2022-03-07

Applicant: Denka Company Limited

Inventor： Wataru NISHINO ,  Suguru ONUKI ,  Ryotaro ANDO

IPC: C08F236/18

CPC classification number: C08F236/18

Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has peak tops at 5.80 to 6.00 ppm and 5.10 to 5.30 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is 0.9/100 to 1.1/100, and the peak area A, the peak area B, and a peak area C at 5.10 to 5.30 ppm satisfy formula “(C−2A)/B≤2.0/100”, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.

公开(公告)号：US20200165421A1

公开(公告)日：2020-05-28

申请号：US16631594

申请日：2018-07-20

Applicant: DENKA COMPANY LIMITED

Inventor： Yuhei ISHIGAKI ,  Shogo HAGIWARA ,  Uichiro YAMAGISHI ,  Suguru ONUKI ,  Kosuke FUJIMOTO ,  Wataru NISHINO

IPC: C08L15/02 ,  C08F36/18 ,  C09J115/02

Abstract: Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.)

公开(公告)号：US20190389994A1

公开(公告)日：2019-12-26

申请号：US16481752

申请日：2018-03-29

Applicant: DENKA COMPANY LIMITED

Inventor： Wataru NISHINO ,  Yuhei ISHIGAKI ,  Takashi AIZAWA ,  Shogo HAGIWARA ,  Uichiro YAMAGISHI

IPC: C08F293/00 ,  C09J153/02

Abstract: To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total. (In Chemical Formula (1), R1 is hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group)

公开(公告)号：US20240117161A1

公开(公告)日：2024-04-11

申请号：US18274370

申请日：2022-03-24

Applicant: DENKA COMPANY LIMITED

Inventor： Seiya TOMIZAWA ,  Wataru NISHINO ,  Misaki TADA

IPC: C08L11/02 ,  C08F2/22 ,  C08F236/18 ,  C09J111/02

CPC classification number: C08L11/02 ,  C08F2/22 ,  C08F236/18 ,  C09J111/02

Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.

公开(公告)号：US20240117083A1

公开(公告)日：2024-04-11

申请号：US18274281

申请日：2022-03-24

Applicant: DENKA COMPANY LIMITED

Inventor： Seiya TOMIZAWA ,  Wataru NISHINO ,  Misaki TADA

IPC: C08F36/18 ,  C08C4/00 ,  C08F2/22 ,  C08L11/02

CPC classification number: C08F36/18 ,  C08C4/00 ,  C08F2/22 ,  C08L11/02 ,  C08L2312/00

Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.

公开(公告)号：US20220325071A1

公开(公告)日：2022-10-13

申请号：US17636740

申请日：2020-08-12

Applicant: Denka Company Limited

Inventor： Atsunori KONDO ,  Wataru NISHINO ,  Suguru ONUKI

IPC: C08K5/14 ,  C08K5/3415 ,  C08F236/18

Abstract: A rubber composition containing: 100 parts by mass of a chloroprene-based rubber; 0.50 to 4.0 parts by mass of a maleimide compound; and 0.10 to 2.0 parts by mass of an organic peroxide, a vulcanizate of this rubber composition, and a vulcanized molded article of this rubber composition.