公开(公告)号：US20240066485A1

公开(公告)日：2024-02-29

申请号：US18259631

申请日：2021-12-23

Applicant: DESMET BALLESTRA S.P.A.

Inventor： Fabrizio NAVA ,  Ilio SEBASTIANI ,  Icilio ADAMI ,  Antonino MILICIA ,  Rocco Alessandro DI BENEDETTO ,  Federico Piero GHIONI ,  Loris PELI

IPC: B01J4/00 ,  B01J4/02 ,  B01J10/02 ,  B01J19/00 ,  B01J19/24 ,  C01B17/80

CPC classification number: B01J4/002 ,  B01J4/02 ,  B01J10/02 ,  B01J19/0013 ,  B01J19/006 ,  B01J19/248 ,  C01B17/80 ,  B01J2204/002 ,  B01J2219/00763

Abstract: A continuous falling film reactor includes a reactor body including chambers for a reaction between first and second reagents. The chambers have a respective inner surface, for the sliding of the first reagent in the form of a thin film, or layer, a device for introducing the first reagent, in particular in the liquid phase, especially in the form of an organic raw material, into the respective chamber and a device for inputting the second reagent, in particular in the gaseous phase, especially in the form of sulphuric anhydride, in the respective one of the chambers. A head introduces the first reagent, in the respective chamber, which head—includes a corresponding nozzle so calibrated to cause a predetermined load loss of said first reagent.